Method for producing titania-doped fused silica glass
AssigneeCorning Incorporated
InventorsBradford G. Ackerman, Kenneth E. Hrdina, Lisa A. Moore, Nikki J. Russo, C. Charles Yu
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Abstract
A method for producing a fused silica glass containing titania includes synthesizing particles of silica and titania by delivering a mixture of a silica precursor and a titania precursor to a burner, growing a porous preform by successively depositing the particles on a deposition surface while rotating and translating the deposition surface relative to the burner, and consolidating the porous preform into a dense glass.
Claims19
A method for producing a fused silica glass containing titania, comprising:
- synthesizing particles of silica and titania by delivering a mixture of a silica precursor and a titania precursor to a burner;
- growing a porous preform by successively depositing the particles on a deposition surface while rotating and translating the deposition surface relative to the burner;
- and
- consolidating the porous preform into a dense glass.
A method for producing a fused silica glass containing titania and having low OH content, comprising:
- synthesizing particles of silica and titania by delivering a mixture of a silica precursor and a titania precursor to a burner;
- growing a porous preform by successively depositing the particles on a deposition surface while rotating and translating the deposition surface relative to the burner;
- dehydrating the porous preform by exposing the porous preform to a heated, halide-containing atmosphere;
- and
- consolidating the dehydrated porous preform into a dense glass.
A mask blank for extreme ultraviolet lithography made by a process comprising:
- synthesizing particles of silica and titania by delivering a mixture of a silica precursor and a titania precursor to a burner;
- growing a porous preform by successively depositing the particles on a deposition surface while rotating and translating the deposition surface relative to the burner;
- consolidating the porous preform into a dense glass;
- and
- finishing the dense glass into a mask blank.
A mask blank for extreme ultraviolet lithography made by a process comprising:
- synthesizing particles of silica and titania by delivering a mixture of a silica precursor and a titania precursor to a burner;
- growing a porous preform by successively depositing the particles on a deposition surface while rotating and translating the deposition surface relative to the burner;
- dehydrating the porous preform by exposing the porous preform to a heated, halide-containing atmosphere;
- consolidating the porous preform into a dense glass;
- and
- finishing the dense glass into a mask blank.
Dependencies are inferred from the claim text.