Method for manufacturing surface acoustic wave apparatus
AssigneeMurata Manufacturing Co., Ltd.
InventorsMasatoshi Nakagawa, Makoto Tose, Yoshihiro Koshido, Koji Fujimoto, Takeshi Nakao
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Abstract
A method for manufacturing a surface acoustic wave apparatus decreases a specific resistance of an electrode film by removing hydrogen occluded in the electrode film that is primarily composed of tantalum, so that the device properties are stabilized. An electrode film primarily composed of tantalum is formed on a piezoelectric substrate. Subsequently, this electrode film is heat-treated in a vacuum at a temperature of about 200° C. to about 700° C. for several hours. Thereafter, the electrode film is patterned so as to produce an interdigital electrode transducer.
Claims21
A method for manufacturing a surface acoustic wave apparatus, comprising the steps of:
- forming an electrode film primarily comprising tantalum on a piezoelectric substrate;
- working said electrode film into a desired shape;
- and
- heat-treating said electrode film at a temperature within a range from about 200° C. to about 700° C.
A method for manufacturing a surface acoustic wave apparatus, comprising the steps of:
- forming an electrode film primarily composed of tantalum on a piezoelectric substrate in a vacuum;
- working said electrode film into a desired shape;
- and
- heat-treating said electrode film at a temperature within a range from about 300° C. to about 700° C.
Dependencies are inferred from the claim text.