Method and apparatus for inspecting a structure using X-rays
AssigneeLockheed Martin Corporation
InventorRichard Reim
Life of this patent
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Abstract
The present invention is directed to an apparatus and method for examining small structures such as micro circuit structures. Exemplary embodiments can generate narrow electron beams for examining the micro circuits, and can eliminate the traversing of the x-rays through materials other than a target material and the sample structure. Exemplary embodiments eliminate having the x-rays traverse both a wafer and a plating target on the wafer being examined, by using a target material placed closer to the sample structure. Exemplary embodiments provide adequate magnification to perform fault analysis of small structures and provide an adequate contrast pattern for viewing images of the micro circuit being examined.
Claims34
An apparatus for inspecting a structure comprising:
- means for supporting a target material;
- means for supplying an electron beam to the target material to convert the electron beam into x-ray radiation which is emitted directly into a structure to be inspected;
- and
- means for producing an image using x-ray radiation emitted from the structure to be inspected.
A method for inspecting a structure comprising the steps of:
- forming a support with a target material;
- supplying an electron beam onto a surface of said target material to convert the electron beam into x-ray radiation which is emitted into a structure to be inspected;
- and
- producing an image using x-ray radiation emitted from the target material to be inspected.
An apparatus for inspecting a structure, comprising:
- an electron beam generator for supplying an electron beam to an inspection area;
- a target material for generating x-rays in response to the electron beam;
- an x-ray phosphor, located a predetermined distance from at least a portion of the inspection area, for receiving the x-rays from the target material;
- means adjacent to the x-ray phosphor for receiving light photons produced by the x-ray phosphor as an image of a structure included in the inspection area and for producing an image of the structure.
Dependencies are inferred from the claim text.