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US 2002/0154319 A1Published application
Film thickness measuring apparatus
AssigneeHoriba, Ltd.
InventorsTomoya Yoshizawa, Kunio Otsuki
Life of this patent
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Abstract
A film thickness measuring apparatus capable of restricting a measurement area on the surface of a sample is provided. An incident optical system provides an irradiating polarized light to the surface of the sample. A detecting optical system receives the reflected light having an elliptical polarization and provides a reduced aperture that can restrict the light provided through a fiber optic conduit to a spectrometer and thereby eliminate aberrations and noise problems.
Claims20
A film thickness measuring apparatus comprising:
- a source of light;
- an incident optical system for polarizing and directing light to a sample;
- a detector optical system for receiving light from the sample, including a restricted aperture for defining a field of view on the sample;
- and
- a sensor unit for providing an output representative of the light from the sample.
2 more elements
A film thickness measuring apparatus comprising:
- a source of multi-wavelength light;
- an incident optical system for polarizing and directing the light to a sample;
- a detector optical system for receiving light from the sample, including a plurality of restricted apertures, each capable of defining a field of view of a different size on the sample;
- and
- a spectrometer for providing an output representative of the light from the sample through one of the plurality of restricted appertures.
2 more elements
A film thickness measuring apparatus comprising:
- a source of multi-wavelength light;
- an incident optical system for polarizing and directing an incident light beam to a sample in a first state of polarization that can be changed to a second state of polarization by reflection from the sample;
- a detector optical system for receiving light reflected from the sample, including an analyzer member and a pinhole aperture member for defining a reduced diameter of the reflected light beam relative to the incident light beam;
- and
- a spectrometer for providing an output representative of the reflected light beam, in the second state of polarization, from the sample, the pinhole aperture member is positioned on an optical axis between the spectrometer and the analyzer member.
2 more elements
Dependencies are inferred from the claim text.