US 2002/0153529 A1Published application

LED array with optical isolation structure and method of manufacturing the same

OwnerJin-Shown Shieinventor

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Abstract

A Light Emitting Diode array (LED) with an optical isolation structure and a method of manufacturing the same. The LED array with an optical isolation structure includes a substrate, a plurality of LED units and a plurality of trenches. The plural LED units and trenches are disposed on the surface of the substrate. Each trench is disposed between every two LED units and deposited with at least one reflective metal layer. The substrate of the LED array with an optical isolation structure is formed of a low-energy-gap semiconductor material, while the LED units are formed by another kind of semiconductor material whose energy gap is higher than the substrate. The light emitted from each LED unit is reflected by the plural trenches deposited with at least one reflective metal layer, and absorbed by the substrate with low-energy gap.

Claims12

Dependent claims

A light emitting diode array with an optical isolation structure, comprising:

a substrate made of a semiconductor material;
a plurality of light emitting diode units formed on said substrate, therein, each light emitting diode unit having a PN junction layer made of a semiconductor material whose energy gap is higher than said substrate;
a plurality of trenches formed on said substrate, each trench is located between every two adjacent said light emitting diode units and used to isolate said adjacent plural light emitting diode units, therein, the depth of said trenches is larger than the depth of said light emitting diode units;
a first insulation layer formed on said substrate, said first insulation layer is formed on the surface of said plural light emitting diode units and on the surfaces inside said plural trenches;
a first reflective metal layer formed on said substrate, said first reflective metal layer is formed on the surface inside said plural trenches and overlaid on the first insulation layer formed inside said plural trenches
a second insulation layer formed on said substrate, said second insulation layer is formed on the surface inside said plural trenches and overlaid on the first reflective metal layer formed inside said plural trenches;
a passivation layer formed on said substrate, said passivation layer is overlaid on the surface of the first insulation layer formed on said plural light emitting diode units, and on the surface of the second insulation layer formed inside said plural trenches;
a plurality of contact windows formed on said plural light emitting diode units, therein, said plural contact windows are etched through the passivation layer and the first insulation layer on said plural light emitting diode units, making part of the PN junction layer of said plural light emitting diode units exposed to said contact windows;
a plurality of metal bonding pads formed on said substrate, therein, said plural metal bonding pads are connected to the PN junction layers of said plural light emitting diode units through said plural contact windows;
and
a backside metal layer, formed on the backside of said substrate.

8 more elements

A method of fabricating a light emitting diode array with an optical isolation structure, comprising:

preparing a substrate, said substrate is made of a semiconductor material;
forming a epitaxy layer on the surface of said substrate, said epitaxy layer is made of semiconductor material whose energy gap is higher than said substrate;
transforming said epitaxy layer into a PN junction layer;
patterning a plurality of light emitting diode unit areas on the surface of said PN junction layer with photolithography technology;
forming a plurality of trenches and a plurality of light emitting diode units by removing the PN junction layer and part of said substrate disposed in said plural light emitting diode unit areas, therein, the depth of said plural trenches is larger than the depth of said PN junction layer;
depositing a first insulation layer on the entire surface of said substrate with a PECVD technology;
depositing a first reflective metal layer on the entire surface of said substrate, said first reflective metal layer is deposited on the surface of said first insulation layer;
planarizing the surface of said substrate and refilling said plural trenches by coating an second insulation layer on the entire surface of said substrate, therein, said second insulation layer is deposited on the surface of said first reflective metal layer;
removing part of said secondary insulation layer with etching technology, therein, only said second insulation layer formed inside said plural trenches is remained after this step;
removing part of said first reflective metal layer with etching technology, therein, only said first reflective metal layer formed inside said plural trenches is remained after this step;
depositing a passivation layer on the entire surface of said substrate;
patterning a plurality of contact window areas on the surface of said passivation layer with photolithography technology;
forming a plurality of contact windows by removing said passivation layer and said first insulation layer exposed to said plural contact window areas with etching technology;
depositing a second metal layer on the entire surface of said substrate;
patterning a plurality of metal bonding pad areas on the surface of said second metal layer with photolithography technology;
forming a plurality of metal bonding pads by removing part of said second metal layer with etching technology, therein, only said second metal layer formed in said plural metal bonding pad areas is remained after this step;
and
depositing a third metal layer on the backside of said substrate as a backside metal layer.

15 more elements

Dependencies are inferred from the claim text.