Apparatus and method for coating substrates
AssigneeRTC Systems Ltd.
InventorDesmond Gibson
Life of this patent
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Abstract
Apparatus (10) for treating a substrate, comprising: a vacuum chamber (12); a substrate carrier (14) adapted to carry a substrate (16) to be treated; a source material holder (22) for holding a source material (34) with which the substrate (16) is to be treated; and vaporising or sputtering means (20) for vaporising/sputtering the source material (34); wherein the source material holder (22) includes a positioning means (24) for relatively moving the source material (34) towards the substrate carrier (14).
Claims34
Apparatus for treating a substrate, comprising:
- a vacuum chamber;
- a substrate carrier adapted to carry a substrate to be treated;
- a source material holder for holding a source material with which the substrate is to be treated;
- and vaporising/sputtering means for vaporising/sputtering the source material;
- wherein the source material holder includes a positioning means for relatively moving the source material towards the substrate carrier.
A method of treating a substrate with a source material initially disposed in a source material holder, said method comprising evaporating or sputtering the source material from a surface thereof under vacuum conditions to provide a vaporised or sputtered material for use in treating the substrate, and relatively moving the source material holder towards the substrate carrier as the source material is evaporated or sputtered.
A source material holder for holding a source material intended for vaporisation or sputtering and subsequent treatment of a substrate carried on a substrate carrier, said source material holder comprising a receptacle adapted to contain the source material, means to rotate the receptacle, and means to move the receptacle in a linearly, whereby the source material holder can be rotated and moved linearly simultaneously.
Apparatus for treating a substrate, comprising:
- a vacuum chamber;
- a substrate carrier adapted to carry a substrate to be treated;
- a source material holder for holding a source material which is to treat the substrate;
- and vaporising/sputtering means for vaporising/sputtering the source material;
- wherein the vaporising/sputtering means includes means to generate a vaporising/sputtering beam for vaporising/sputtering the source material at a surface thereof, and includes means to vary the frequency of the vaporising/sputtering beam.
Apparatus for treating a substrate, comprising:
- a vacuum chamber;
- a substrate carrier adapted to carry a substrate to be treated;
- a source material holder for holding a source material which is to treat the substrate;
- and vaporising/sputtering means for vaporising/sputtering the source material;
- wherein the vaporising/sputtering means includes means to generate a vaporising/sputtering beam for vaporising/sputtering the source material at a surface thereof, and includes means to vary the thickness of the vaporising/sputtering beam.
Apparatus for treating a substrate, comprising:
- a vacuum chamber;
- a substrate carrier adapted to carry a substrate to be treated;
- a source material holder for holding a source material which is to treat the substrate;
- and vaporising/sputtering means for vaporising/sputtering the source material;
- wherein the vaporising/sputtering means includes means to generate a vaporising/sputtering beam for vaporising/sputtering the source material at a surface thereof, and includes means to dither the vaporising/sputtering beam over the surface of the source material.
Dependencies are inferred from the claim text.