Back to results
US 2002/0153101 A1Published application
Semiconductor processing system and method
AssigneeSimplus Systems Corporation
InventorsTue Nguyen, Tai Dung Nguyen, Craig Alan Bercaw
Life of this patent
Estimating the term…
Abstract
Systems and methods are disclosed to perform semiconductor processing with a process chamber; a flash lamp adapted to be repetitively triggered; and a controller coupled to the control input of the flash lamp to trigger the flash lamp. The system can deploy a solid state plasma source in parallel with the flash lamp in wafer processing.
Claims20
An apparatus to perform semiconductor processing, comprising:
- a process chamber;
- a flash lamp adapted to be repetitively pulsed;
- and
- a controller coupled to the control input of the flash lamp to trigger the flash lamp.
1 more element
A method to deposit multi-layer films on a semiconductor, comprising:
- (a) introducing a gas into a processing chamber;
- and
- (b) triggering a flash lamp to generate thermal energy in the chamber to deposit a layer.
A multi-layer semiconductor processing chamber, comprising:
- a gas source coupled to the chamber for introducing a processing gas into a reaction chamber having a sample disposed therein;
- a high intensity flash lamp coupled to the chamber to react the processing gas;
- and
- a controller coupled to the flash lamp to trigger the flash lamp for each deposited layer.
1 more element
Dependencies are inferred from the claim text.