Substrate processing apparatus

A substrate processing apparatus comprising a coating section including a first processing section for supplying a coating solution to a substrate, and a second processing section for supplying a cleaning solution to the substrate processed by said first processing section,

• wherein said first processing section includes:
• first substrate holding means for holding the substrate in horizontal posture while supporting a first support area on a back surface of the substrate;
• and
• coating solution supplying means for supplying the coating solution to a front surface of the substrate held by said first substrate holding means;
• and
• said second processing section includes:
• second substrate holding means for holding the substrate in horizontal posture while supporting a second support area different from said first support area;
• and
• cleaning solution supplying means for supplying the cleaning solution to clean a part or whole of said first support area on the back surface of the substrate held by said second substrate holding means.

A substrate processing apparatus comprising a coating section for forming a film of coating solution on a substrate:

• wherein said coating section includes a first processing section for supplying a coating solution to the substrate, and a second processing section for supplying a cleaning solution to the substrate processed by said first processing section;
• said apparatus further comprising second transport means for transporting the substrate between a plurality of processing sections including said first and second processing sections;
• said first processing section including:
• first substrate holding means for holding the substrate in horizontal posture while supporting a first support area on a back surface of the substrate;
• and
• coating solution supplying means for supplying the coating solution to a front surface of the substrate held by said first substrate holding means;
• and
• said second processing section including:
• second substrate holding means for holding the substrate in horizontal posture while supporting a second support area different from said first support area;
• and said first substrate holding means;
• and
• said second processing section including:
• second substrate holding means for holding the substrate in horizontal posture while supporting a second support area different from said first support area;
• and
• cleaning solution supplying means for supplying the cleaning solution to clean a part or whole of said first support area on the back surface of the substrate held by said second substrate holding means.

A substrate processing apparatus comprising a coating section for forming a film of coating solution on a substrate:

• wherein said coating section includes a first processing section for supplying a coating solution to the substrate, and a second processing section for supplying a cleaning solution to the substrate processed by said first processing section;
• said apparatus further comprising second transport means for transporting the substrate between a plurality of processing sections including said first and second processing sections, an external processing apparatus connected to said substrate processing apparatus, and an interface for relaying transfer of the substrate between said processing sections and said external processing apparatus;
• said first processing section including:
• first substrate holding means for holding the substrate in horizontal posture while supporting a first support area on a back surface of the substrate;
• and
• coating solution supplying means for supplying the coating solution to a front surface of the substrate held by
• a second partial processing unit for performing a partial process having a shorter processing time than a process performed by each of said first partial processing units;
• said plurality of first partial processing units performing a parallel processing.

A substrate processing apparatus comprising:

• a plurality of processing units for performing one stage of operation in which a processing object is in form of a particular substance on a substrate or in a particular form of energy relating to the substrate, said one stage being divided into a plurality of processes each involving an increase or decrease of said processing object;
• and
• a transport mechanism for transporting said substrate to said plurality of processing units;
• at least said processing units including:
• a plurality of first partial processing units;
• and
• cleaning solution supplying means for supplying the cleaning solution to clean a part or whole of said first support area on the back surface of the substrate held by said second substrate holding means.