Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method
AssigneeFujitsu Limited
InventorsMiwa Kozawa, Keiji Watanabe, Ei Yano
Life of this patent
Estimating the term…
Abstract
A silicon-containing polymer having a tetrafunctional siloxane portion as the basic skeleton, and containing a carboxylic acid group-containing triorganosiloxane portion and a carboxylic acid derivative group-containing triorganosiloxane portion in a specific proportion. It may be advantageously used as a negative non-chemical amplification resist polymer or a positive chemical amplification resist polymer.
Claims17
A silicon-containing polymer comprising the structure represented by formula 1 below as a main structural unit.
- 4
- where R1 represents a monovalent organic group, R2 represents a direct bond or a divalent organic group, R3 represents a monovalent organic group or an organosilyl group, any of which groups may be of different types, X represents hydrogen, a monovalent organic group or an organosilyl group, which groups may be of different types, k and l are positive integers, m and n are 0 or positive integers, and these subscripts satisfy the following relationship.
- 11 0 < l l + m + n ≦ 0.8 0 ≦ m l + m < 0.2
A silicon-containing polymer comprising the structure represented by formula 3 below as a main structural unit.
- 6
- where R1 represents a monovalent organic group, R2 represents a direct bond or a divalent organic group, R7 and R8 each independently represent a monovalent organic group or an organosilyl group, any of which groups may be of different types, X represents hydrogen, a monovalent organic group or an organosilyl group, which groups may be of different types, k and q are positive integers, l, n and p are 0 or positive integers, and these subscripts satisfy the following relationship.
- 13 0 ≦ l l + n + p + q < 0.5 0.1 < q l + n + p + q ≦ 0.8
Dependencies are inferred from the claim text.