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US 2002/0118973 A1Published application
Substrate processing apparatus and substrate processing method
AssigneeTokyo Electron Limited
InventorsIssei Ueda, Shinichi Hayashi, Naruaki Iida, Yuji Matsuyama, Yoichi Deguchi
Life of this patent
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Abstract
Thermal processing unit sections each with ten tiers and coating processing unit sections each with five tiers are disposed around a first main wafer transfer section and a second main wafer transfer section, and in the thermal processing unit section, the influence of the time required for substrate temperature regulation processing on a drop in throughput can be reduced greatly by transferring the wafer W while the temperature of the wafer W is being regulated by a temperature regulation and transfer device.
Claims82
A substrate processing apparatus, comprising:
- a main transfer section for transferring a substrate:
- temperature regulating sections, disposed around said main transfer section in at least two directions facing each other out of four directions, for receiving and sending the substrate from/to said main transfer device and regulating the temperature of the substrate at a predetermined temperature:
- a thermal processing section for processing the substrate at a temperature not less than the predetermined temperature;
- and
- moving means for moving said temperature regulating section to deliver the substrate from/to said temperature regulating section to/from said thermal processing section.
2 more elements
A substrate processing apparatus, comprising:
- a temperature regulating section for regulating the temperature of a substrate at a predetermined temperature;
- a temperature regulation and transfer mechanism for regulating the temperature of the substrate at a predetermined temperature and transferring the substrate;
- and
- a main transfer section for receiving and sending the substrate from/to said temperature regulating section and said temperature regulation and transfer mechanism.
1 more element
A substrate processing apparatus, comprising:
- a processing section for performing thermal processing for a substrate;
- a temperature regulation and transfer mechanism for regulating the temperature of the substrate at a predetermined temperature and transferring the substrate from/to said processing section;
- and
- a fist and a second main transfer section, disposed on both sides of said temperature regulation and transfer mechanism, for transferring the substrate from/to said temperature regulation and transfer mechanism.
1 more element
A substrate processing apparatus, comprising:
- a main transfer section for transferring a substrate;
- a processing section for performing thermal processing for the substrate;
- and
- a temperature regulation and transfer section for regulating the temperature of the substrate at a predetermined temperature and transferring the substrate between said main transfer section and said processing section.
1 more element
A substrate processing apparatus, comprising:
- a main transfer section for transferring a substrate:
- a first processing section for performing thermal processing for the substrate;
- a second processing section for performing thermal processing for the substrate;
- and
- a temperature regulation and transfer section for regulating the temperature of the substrate at a predetermined temperature and transferring the substrate between said main transfer section, and said first processing section and said second processing section,
- said first processing section, said second processing section, and said temperature regulation and transfer section being disposed linearly.
3 more elements
A substrate processing apparatus, comprising:
- a temperature regulating section for regulating the temperature of a substrate at a predetermined temperature;
- a processing section for performing thermal processing for the substrate;
- a main transfer section for receiving and sending the substrate at least from/to said temperature regulating section;
- and
- a sub-transfer section for transferring the substrate between said temperature regulating section and said processing section.
2 more elements
A substrate processing apparatus, comprising:
- a temperature regulating section for regulating the temperature of a substrate at a predetermined temperature;
- a first processing section for performing thermal processing for the substrate;
- a second processing section for performing thermal processing for the substrate;
- a main transfer section for receiving and sending the substrate at least from/to said temperature regulating section;
- and
- a sub-transfer section for transferring the substrate between said temperature regulating section, said first processing section, and said second processing section,
- said temperature regulating section, said first processing section, and said second processing section being disposed linearly.
4 more elements
A substrate processing apparatus, comprising:
- a main transfer section for transferring a substrate;
- a processing section for performing thermal processing for the substrate;
- a temperature regulation and transfer section for regulating the temperature of the substrate at a predetermined temperature and transferring the substrate from/to said processing section;
- and
- a plurality of ascending and descending pins which are ascendable and descendable, for receiving and sending the substrate from/to said main transfer section when the pins are raised fully, and receiving and sending the substrate from/to said temperature regulation and transfer section when the pins are lowered fully.
2 more elements
A substrate processing apparatus, comprising:
- a main transfer section for transferring a substrate;
- a first processing section for performing thermal processing for the substrate;
- a second processing section for performing thermal processing for the substrate;
- a temperature regulation and transfer section for regulating the temperature of the substrate at a predetermined temperature and transferring the substrate between said first processing section and said second processing section;
- and
- a plurality of ascending and descending pins which are ascendable and descendable, for receiving and sending the substrate from/to said main transfer section when the pins are raised fully, and receiving and sending the substrate from/to said temperature regulation and transfer section when the pins are lowered fully,
- said first processing section, said second processing section, said temperature regulation and transfer section, and said ascending and descending pins being disposed linearly.
4 more elements
A substrate processing apparatus, comprising:
- a processing unit having openings for the delivery of a substrate on both sides;
- and
- a first and second main transfer sections, disposed to face the respective openings of said processing unit, for carrying the substrate into/out of said processing unit through the openings,
- said processing unit, comprising:
- a processing section for performing thermal processing for the substrate;
- and
- a temperature regulation and transfer section for regulating the temperature of the substrate at a predetermined temperature and transferring the substrate from/to said first and second transfer sections through the respective openings and from/to said processing section.
4 more elements
A substrate processing apparatus, comprising:
- a processing unit having openings for the delivery of a substrate on both sides;
- and
- a first and second main transfer sections, disposed to face the respective openings of said processing unit, for carrying the substrate into/out of said processing unit through the openings,
- said processing unit, comprising:
- a first processing section for performing thermal processing for the substrate;
- a second processing section for performing thermal processing for the substrate;
- and
- a temperature regulation and transfer section for regulating the temperature of the substrate at a predetermined temperature and transferring the substrate from/to said first and second transfer sections through the respective openings and between said first processing section and said second processing section,
- said first processing section, said second processing section, and said temperature regulation and transfer section being disposed linearly.
6 more elements
A substrate processing apparatus, comprising:
- a processing unit having openings for the delivery of a substrate on both sides;
- and
- a first and second main transfer sections, disposed to face the respective openings of said processing unit, for carrying the substrate into/out of said processing unit through the openings,
- said processing unit, comprising:
- a temperature regulating section for receiving and sending the substrate from/to said first and second transfer sections through the openings and regulating the temperature of the substrate at a predetermined temperature;
- a processing section for performing thermal processing for the substrate;
- and
- a sub-transfer section for transferring the substrate between said temperature regulating section and said processing section.
5 more elements
A substrate processing section, comprising:
- a processing unit having openings for the delivery of a substrate on both sides;
- and
- a first and second main transfer sections, disposed to face the respective openings of said processing unit, for carrying the substrate into/out of said processing unit through the openings,
- said processing unit, comprising:
- a temperature regulating section for receiving and sending the substrate from/to said first and second transfer sections through the openings and regulating the temperature of the substrate at a predetermined temperature;
- a first processing section for performing thermal processing for the substrate;
- a second processing section for performing thermal processing for the substrate;
- and
- a sub-transfer section for transferring the substrate between said temperature regulating section, said first processing section, and said second processing section,
- said temperature regulating section, said first processing section, and said second processing section being disposed linearly.
7 more elements
A substrate processing apparatus, comprising:
- a processing unit having openings for the delivery of a substrate on both sides;
- and
- a first and second main transfer sections, disposed to face the respective openings of said processing unit, for carrying the substrate into/out of said processing unit through the openings,
- said processing unit, comprising:
- a processing section for performing thermal processing for the substrate;
- a temperature regulation and transfer section for regulating the temperature of the substrate at a predetermined temperature and transferring the substrate from/to said processing section;
- and
- a plurality of ascending and descending pins which are ascendable and descendable, for receiving and sending the substrate from/to said first and second main transfer sections through the openings when the pins are raised fully, and receiving and sending the substrate from/to said temperature regulation and transfer section when the pins are lowered fully.
5 more elements
A substrate processing apparatus, comprising:
- a processing unit having openings for the delivery of a substrate on both sides;
- and
- a first and second main transfer sections, disposed to face the respective openings of said processing unit, for carrying the substrate into/out of said processing unit through the openings,
- said processing unit, comprising:
- a first processing section for performing thermal processing for the substrate;
- a second processing section for performing thermal processing for the substrate;
- a temperature regulation and transfer section for regulating the temperature of the substrate at a predetermined temperature and transferring the substrate between said first processing section and said second processing section;
- and
- a plurality of ascending and descending pins which are ascendable and descendable, for receiving and sending the substrate from/to said first and second main transfer sections through the openings when the pins are raised fully, and receiving and sending the substrate from/to said temperature regulation and transfer section when the pins are lowered fully,
- said first processing section, said second processing section, said temperature regulation and transfer section, and said ascending and descending pins being disposed linearly.
7 more elements
A substrate processing apparatus, comprising:
- a main transfer section for transferring a substrate;
- a processing unit, disposed around said main transfer section, at least for performing thermal processing for the substrate;
- a solution supplying unit, disposed around said main transfer section, for supplying a predetermined solution onto the substrate;
- and
- means for controlling atmospheric pressure so that said solution supplying unit has more positive pressure than said processing unit and said main transfer section and so that said main transfer section and said processing unit have almost the same atmospheric pressure.
2 more elements
A substrate processing apparatus, comprising:
- a main transfer section for transferring a substrate;
- a solution supplying unit, disposed around said main transfer section, for supplying a predetermined solution onto the substrate;
- a processing unit, disposed around said main transfer section;
- and
- unit temperature regulating means for performing temperature regulation or humidity control in said main transfer section, said solution supplying unit, and said processing unit separately,
- said processing unit, comprising:
- a temperature regulating section, disposed to adjoin said main transfer section, for regulating the temperature of the substrate at a predetermined temperature;
- and
- a processing section, disposed so that said temperature regulating section is positioned between said main transfer section and said processing section itself, for performing thermal processing for the substrate.
6 more elements
A substrate processing apparatus, comprising:
- a processing unit group in which processing units each having a processing section for performing thermal processing for a substrate and a temperature regulating section for regulating the temperature of the substrate at a predetermined temperature are vertically disposed in multiple tiers;
- a first main transfer device which is vertical transfer-type, disposed on one side of said processing unit group and allowed to get access to each of the processing units;
- a first solution supplying unit, disposed around said first main transfer device for supplying a predetermined solution onto the substrate;
- a second main transfer device which is a vertical transfer-type, disposed on the other side of said processing unit group and allowed to get access to each of the processing units and to move in a predetermined plane direction;
- and
- a plurality of second solution supplying units, disposed along the direction of plane movement of said second main transfer device, each for supplying a predetermined solution onto the substrate.
3 more elements
A substrate processing apparatus, comprising:
- a substrate transfer device for transferring a substrate;
- and
- processing units disposed on both sides and at the front of said substrate transfer device,
- said processing units at least on one side being vertically disposed in multiple tiers, and
- said substrate transfer device being a vertical transfer type capable of receiving and sending the substrate from/to each of the units, in which a supporting member for vertically supporting said substrate transfer device is attached on the side of said processing unit disposed at the front.
2 more elements
A substrate processing apparatus, comprising:
- a first processing unit having a first and second openings for the delivery of a substrate on both sides;
- a first and second transfer devices, disposed to face the respective openings of said first processing unit, for carrying the substrate into/out of said first processing unit through the respective openings;
- a first and second shutter members for opening and closing the respective openings;
- and
- means for controlling the opening and closing of the shutter members so that the second opening is closed when the first opening is open.
2 more elements
A substrate processing apparatus, comprising:
- a transfer device for delivering a substrate;
- a first and second processing units disposed to adjoin said transfer device, each having a first and second openings for the delivery of the substrate from/to said transfer device on both sides;
- a first and second shutter members for opening and closing the respective openings;
- and
- means for controlling the opening and closing of the shutter members so that the second opening is closed when the first opening is open.
2 more elements
A substrate processing apparatus, comprising:
- a transfer device for delivering a substrate;
- a first and second processing units disposed to adjoin said transfer device, each having a first and second openings for the delivery of the substrate from/to said transfer device on both sides;
- a first and second shutter members for opening and closing the respective openings;
- and
- means for controlling the opening and closing of the shutter members so that the second opening is closed when the first opening is open.
2 more elements
A substrate processing apparatus, comprising:
- a main transfer device for transferring a substrate;
- a first processing unit, disposed to adjoin the front face side of said main transfer device, for receiving and sending the substrate from/to said main transfer device and supplying a predetermined solution to the substrate;
- and
- a second processing unit, disposed to adjoin one side face of said main transfer device, for receiving and sending the substrate from/to said main transfer device and having a temperature regulating section for regulating the temperature of the substrate at a predetermined temperature and a heating section for performing heat processing for the substrate,
- wherein the temperature regulating section of said second processing unit is disposed to adjoin said main transfer device, and the heating section is disposed to adjoin the temperature regulating section and to protrude to the back side of said main transfer device.
2 more elements
A substrate processing method, comprising the steps of:
- subjecting a substrate to thermal processing in a processing section;
- and
- delivering the substrate subjected to the thermal processing to a main transfer section for transferring the substrate while regulating the temperature of the substrate at a predetermined temperature by a temperature regulation and transfer section.
A substrate processing method, comprising the steps of:
- delivering a substrate from a main transfer section for transferring the substrate to a temperature regulation and transfer section;
- transferring the substrate to a processing section while regulating the temperature of the substrate at a predetermined temperature by the temperature regulation and transfer section;
- and
- subjecting the transferred substrate to thermal processing in the processing section.
1 more element
A substrate processing apparatus, comprising:
- a first processing unit group in which first processing units each for supplying a predetermined solution onto a substrate to perform solution processing are stacked in multiple tiers;
- a second processing unit group in which second processing units, in which a heating section for performing heat processing for the substrate and a temperature regulating section for performing temperature regulation processing for the substrate are disposed adjacent to each other and integrated, are stacked in multiple tiers;
- and
- a transfer device for transferring the substrate between the first processing units and the second processing units,
- said first processing unit group and said second processing unit group being disposed adjacent to each other so that the temperature regulating section out of the heating section and the temperature regulating section in each of the second processing units is positioned on said first processing unit group side.
2 more elements
A substrate processing apparatus, comprising:
- a first processing unit group in which first processing units each for supplying a predetermined solution onto a substrate to perform solution processing are stacked in multiple tiers;
- a processing solution supplying section, disposed adjacent to said first processing unit group, for supplying the predetermined solution to each of the first processing units;
- a second processing unit group in which second processing units, in which a heating section for performing heat processing for the substrate and a temperature regulating section for performing temperature regulation processing for the substrate are disposed adjacent to each other and integrated, are stacked in multiple tiers;
- and
- a transfer device for transferring the substrate between the first processing units and the second processing units,
- said processing solution supplying section and said second processing unit group being disposed adjacent to each other so that the temperature regulating section out of the heating section and the temperature regulating section in each of the second processing units is positioned on said processing solution supplying section side.
3 more elements
A substrate processing apparatus, comprising:
- a first processing unit group in which first processing units each for supplying a predetermined solution onto a substrate to perform solution processing are stacked in multiple tiers;
- a second processing unit group in which second processing units, in which a heating section for performing heat processing for the substrate and a temperature regulating section for performing temperature regulation processing for the substrate are disposed adjacent to each other and integrated, are stacked in multiple tiers;
- and
- an exposure unit for performing exposure processing for the substrate which has undergone the solution processing,
- wherein the substrate is kept waiting in the temperature regulating section of the second processing unit before being carried into said exposure unit.
2 more elements
Dependencies are inferred from the claim text.