Assembling arrays of small particles using an atomic force microscope to define ferroelectric domains
AssigneeInternational Business Machines Corporation
InventorsJames Misewich, Christopher B. Murray, Alejandro G. Schrott
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Abstract
A method of assembling arrays of small particles or molecules using an atomic force microscope to define ferroelectric domains includes depositing a ferroelectric thin film upon a substrate forming workpiece, then using an atomic force microscope having a conductive, tip for generating a pattern on this thin film to define desired nano-circuit patterns. Next, exposure of this thin film to a solution containing chemical species which selectively adsorb or accumulate under the influence of electrophoretic forces in selected regions of this thin film.
Claims28
A method for assembling arrays of small particles using an atomic force microscope (AFM), said method comprising:
- depositing a ferroelectric film layer on a substrate;
- tracing a pattern on said ferroelectric film with said AFM thereby leaving a traced pattern of charged and uncharged domains on said film;
- and
- exposing said ferroelectric film to a composition having nanosized particles, said particles coated with an organic species that selectively accumulate in said traced pattern of said film.
A method of producing three-dimensional submicron heterostructures on a workpiece, said method comprising:
- tracing a modulated pattern on a ferroelectric film layer on said workpiece by an atomic force microscope;
- and
- adsorbing a chemical species on said pattern, wherein said tracing creates a polarization template on said ferroelectric film.
A method for assembling arrays of small particles using an atomic force microscope (AFM), said method comprising:
- depositing a ferroelectric film layer on a substrate;
- tracing a pattern on said ferroelectric film with said AFM thereby leaving a traced pattern of charged and uncharged domains on said film;
- and
- exposing said ferroelectric film to a composition having nanosized particles, said particles coated with an organic species that selectively accumulate in said traced pattern of said film, wherein said exposure of said film includes initially selecting said composition that comprises a solution that includes chemical species of nano sized dielectric particles selected from a group consisting of metallic and semiconductor materials.
Dependencies are inferred from the claim text.