Ink jet head having improved pressure chamber and its manufacturing method

A method for manufacturing an ink jet head, comprising the steps of:

• forming an impurity diffusion layer on at least one of front and back surfaces of a silicon substrate;
• forming an etching mask layer having an opening for a nozzle on a front surface of said silicon substrate;
• performing an anistropic dry etching process upon said silicon substrate using said etching mask layer as a mask and said impurity diffusion layer as an etching stopper;
• and
• performing an anisotropic wet etching process upon said silicon substrate to form a pressure chamber therein, after said anistropic dry etching process is performed.

A method for manufacturing an ink jet head, comprising the steps of:

• forming a first etching mask layer having a first opening for a nozzle on a front surface of a silicon substrate;
• forming a second etching mask layer having a second opening in correspondence with said first opening on a back surface of said silicon substrate;
• performing an anistropic dry etching process upon said silicon substrate using said first and second etching mask layer as masks;
• and
• performing an anisotropic wet etching process upon said silicon substrate to form a pressure chamber therein, after said anistropic dry etching process is performed.