Ion generation chamber
AssigneeInternational Business Machines Corporation
InventorsGary A. Donaldson, Donald W. D. Rakowski, Nick G. Selva
Life of this patent
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Abstract
An ion generator chamber, for an implantation apparatus, having its interior walls surfaces knurled or roughened so that any of the materials used in the chamber cannot deposit onto the interior wall surfaces in a size sufficiently large enough to adversely affect the operation of the chamber, if the deposits peel off the interior walls of the chamber. By limiting the size of any deposits on interior chamber walls, the invention extends the average life of the filaments used in the chamber as well as extending the average time between any necessary cleaning of the inner chamber walls thereby extending the operating life of the chamber.
Claims11
In an ion beam implantation apparatus;
- an ion generation chamber having a generally hollow interior formed from a pair of parallel walls, a top plate, a bottom plate, a first end wall and an opposing end wall;
- each of said pair of parallel walls, top plate, bottom plate, first end wall and opposing end wall each having an interior surface, facing the interior of said chamber, and an exterior surface;
- a cathode positioned in said interior adjacent said first end wall and a reflector electrode positioned adjacent said opposite end wall;
- an ion beam extraction slot in said top plate;
- opposing magnets positioned outside of said chamber so that the direction of the magnetic flux between said magnates is perpendicular to said end walls;
- means for introducing a gaseous material to be ionized into said chamber;
- power supplies coupled to said cathode, said chamber walls, and said reflector plate to ionize said gaseous material in said chamber;
- and
- the interior surfaces of said pair of parallel walls, a top plate, said bottom plate, said first end wall and said opposing end wall all having a roughened surface finish.
An ion implantation apparatus comprising;
- an arc chamber having inwardly facing surfaces;
- said chamber further having two electrodes in the chamber, an inlet for introducing a feed material to be ionized, an outlet for ionizing the feed material within the chamber;
- and
- said inner surfaces having roughened surfaces to prevent the feed material from forming deposits of said feed materials on said surface sufficiently large enough to cause short circuits between said electrodes and said chamber walls if said deposits peel off said inner surfaces.
An ion implantation apparatus comprising;
- an arc chamber in the form of a having inwardly facing surfaces;
- said chamber further having two electrodes in the chamber, an inlet for introducing a feed material to be ionized, an outlet for ionizing the feed material within the chamber;
- and
- said inner surfaces having a series of triangular grooves formed in a direction parallel to the smallest dimension of said hollow rectangular parallelepiped to prevent any material introduced therein from forming deposits on said surfaces sufficiently large enough to shorten the useful life of said chamber if said deposits peel off said inner surfaces.
Dependencies are inferred from the claim text.