Cleaning device with deeply reaching plasma and assisting electrodes
AssigneeNano Electronics and Micro System Technologies, Inc.
InventorsChia-Yuan Hsu, Yong-Hau Foo, Paul Hong
Life of this patent
Estimating the term…
Abstract
A cleaning device with deeply reaching plasma and assisting electrodes has supporting racks, a chamber, a plasma sources, metallic grids. Flat boards to be cleaned such as circuit boards are located in the supporting racks. The supporting racks are disposed in the chamber. The metallic grids are disposed on two sides of the chamber. The plasma source is disposed next to the metallic grids. Electric voltage is applied to the metallic grids such that plasma from the plasma source can be pushed deeply into the supporting racks to evenly and sufficiently clean the circuit boards.
Claims61
A cleaning device with deeply reaching plasma and assisting electrodes, comprising
- plurality of supporting racks, said supporting racks each having openings on a front side and a rear side for permitting flat boards to be inserted there into;
- a chamber, said chamber having room therein for receiving said supporting racks;
- said chamber being capable of getting vacuum;
- plurality of plasma sources;
- said plasma sources being disposed beside two sides of said supporting racks;
- said plasma sources being capable of sending out plasma for cleaning said flat boards;
- plurality of metallic grids, said metallic grids being disposed adjacent to said supporting racks between said supporting racks and said plasma sources;
- electric voltage being applied to said metallic grids for helping said plasma of said plasma sources pushed into said supporting racks.
The cleaning device with deeply reaching plasma and assisting electrodes as claimed in claim 1, wherein said metallic grids have meshes, said meshes being each one to twenty mini meter wide.
The cleaning device with deeply reaching plasma and assisting electrodes as claimed in claim 15, wherein said intermediate frequency ranges from 40 KHZ to 13.56 MHZ.
A cleaning device with deeply reaching plasma and assisting electrodes, comprising
- plurality of supporting racks, said supporting racks having support protrusions therein for locating flat boards to be cleaned, a plasma source, said plasma source being disposed on two sides of said supporting racks;
- said plasma source being capable of sending plasma into said supporting racks to clean said flat boards;
- buffer members;
- said buffer members being disposed between said supporting racks and said plasma source, and connected to said supporting racks;
- said buffer members each having a rack part, and plurality of buffer plates;
- said rack part having support protrusions corresponding to said support protrusions of said support racks;
- said buffer plates being each located by a corresponding one of said buffer member support protrusions in said rack part.
The cleaning device with deeply reaching plasma and assisting electrodes, comprising things to be cleaned are inserted into supporting racks, and one or more of said supporting racks are disposed in chamber;
- plasma sources are disposed on two sides of said supporting racks;
- then, said chamber is made to be vacuum, and then provided with gas for adjusting pressure in said chamber;
- further making plasma sources to plasma;
- wherein characterized in said that two sides of said supporting racks are disposed adjacent to one or more metallic grids, namely between said supporting racks and plasma sources;
- additionally, electric voltage being applied to said metallic grids;
- by this, the metallic grids having electric voltage, can increase the density of the plasma, and push the ions or the electrons of the plasma into the racks deeply. Thus, the cleaning effectiveness and the evenness of the plasma are obviously increased.
Dependencies are inferred from the claim text.