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OwnerMasahito Uchikoshi, Norio Yokoyama +2inventors
InventorsMasahito Uchikoshi, Norio Yokoyama, Tamas Kekesi, Minoru Isshiki
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High purity iron with a very few content of impurities such as copper, a method of manufacturing thereof, and high purity iron targets are provided. The iron containing impurities such as copper is dissolved in a hydrochloric acid solution, and the concentration of the hydrochloric acid of the aqueous solution of iron chloride is adjusted to 0.1 kmol/m3 to 6 kmol/m3. Then, iron is added in the aqueous solution of iron chloride, and an inert gas is injected into the solution with agitating, in order to convert the trivalent iron ions and divalent copper ions contained in the aqueous solution of iron chloride respectively to divalent iron ions and monovalent copper ions. Then, the aqueous solution of iron chloride is fed into a column filled up with the anion exchange resins. The divalent iron ions are not absorbed on the anion exchange resins although the monovalent copper ions are absorbed on the anion exchange resins. Therefore, copper can be separated from the aqueous solution of iron chloride. And then, the aqueous solution of iron chloride is evaporated to dryness, oxidized and heated in a hydrogen atmosphere to generate iron.
High purity iron with 99.99 mass % or more in purity wherein a copper impurity content is 50 mass ppb or less.
High purity iron wherein a residual resistivity ratio thereof is 3000 or more, and a copper impurity content is 50 mass ppb or less.
A method of manufacturing high purity iron comprising the steps of;
A method of manufacturing high purity iron comprising the steps of;
High purity iron targets with 99.99 mass % or more in purity wherein a copper impurity content is 50 mass ppb or less.
High purity iron targets wherein a residual resistivity ratio is 3000 or more, and a copper impurity content is 50 mass ppb or less.
Dependencies are inferred from the claim text.