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US 2002/0093281 A1Published application
Electron emitters and method for forming them
AssigneeMicron Technology, Inc.
InventorDavid A. Cathey
Life of this patent
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Abstract
Electron emitters and a method of fabricating emitters which have a concentration gradient of impurities, such that the highest concentration of impurities is at the apex of the emitters, and decreases toward the base of the emitters. The method comprises the steps of doping, patterning, etching, and oxidizing the substrate, thereby forming the emitters having impurity gradients.
Claims22
A process for fabricating emitters, said process comprising the following steps of:
- forming a dopant concentration gradient in a substrate;
- patterning said substrate;
- selectively removing portions of said substrate, thereby defining emitters.
A method for manufacturing emitters, said method comprising the following steps of:
- selectively removing portions of a substrate, thereby forming emitters, said substrate comprising a dopant, said dopant forms a gradient in said substrate, said selective removal comprising etching.
An emitter comprising:
- an apex and a base;
- a dopant concentration, said concentration being in a gradient, wherein said concentration is greater at said apex and decreases toward said base.
Dependencies are inferred from the claim text.