Radiation-sensitive resin composition
AssigneeJsr Corporation
InventorsMasaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, Toru Kajita, Tsutomu Shimokawa
Life of this patent
Estimating the term…
Loading patent…
AssigneeJsr Corporation
InventorsMasaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, Toru Kajita, Tsutomu Shimokawa
Estimating the term…
A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), 1 wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
A positive-tone radiation-sensitive resin composition comprising (A1) a copolymer which comprises a recurring unit shown by the following formula (1) and/or a recurring unit shown by the following formula (2), and a recurring unit shown by the following formula (3-1), and (B) a photoacid generator,
A radiation-sensitive resin composition comprising:
A radiation-sensitive resin composition comprising:
Dependencies are inferred from the claim text.