System and method for generating a flat mask design for projecting a circuit pattern to a spherical semiconductor device
AssigneeBall Semiconductor, Inc.
InventorsAtsuyuki Fukano, Zhiqiang Feng, Hideki Koide
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AssigneeBall Semiconductor, Inc.
InventorsAtsuyuki Fukano, Zhiqiang Feng, Hideki Koide
Estimating the term…
The present invention provides a method for segmenting and mapping a two-dimensional conventional circuit pattern to a flat mask for projection onto a three-dimensional surface. The circuit pattern is first segmented into a plurality of circuit segments enclosed in a plurality of base units of an imposed grid system. Subsequently, locations and the boundary conditions for a plurality of mask segments on the mask are determined such that no unneeded overlapping at the boundaries of the projected image on the spherical shaped semiconductor device is possible. The mask, along with a photolithography system having a plurality of mirrors, projects the circuit pattern onto the spherical shaped semiconductor device.
A method for generating a mask from a conventional design pattern for projection by a photolithography system onto a three dimensional surface, the method comprising the steps of:
A method for generating a mask from a conventional circuit design for projection onto a surface of a non-planar semiconductor device, the method comprising the steps of:
A system for generating a mask from a circuit design for projection onto a surface of a spherical semiconductor device to implement the circuit design thereon, the system comprising:
A system for projecting a circuit design onto the surface of a spherical shape semiconductor device, said system comprising:
Dependencies are inferred from the claim text.