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US 2002/0055253 A1Published application
Method for producing a micromechanical structure and a micromechanical structure
AssigneeRobert Bosch GmbH
InventorJoachim Rudhard
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Abstract
A method for producing a micromechanical structure, and a micromechanical structure having a movable structure and a stationary structure made of silicon. In the method for producing the micromechanical structure, in one process step, a superficial metal-silicide layer is produced in the movable structure and/or the stationary structure.
Claims7
A method for producing a micromechanical structure, comprising:
- introducing trenches into a silicon layer for forming at least one movable structure and at least one stationary structure from the silicon layer, the movable structure being movable relative to the stationary structure;
- after introducing the trenches, depositing a metal layer on side walls of the trenches;
- after depositing the metal layer, carrying out a thermal treatment by which metal of the metal layer forms a metal silicide with silicon of the silicon layer;
- and
- subsequently carrying out an etching process which removes the metal of the metal layer and does not remove the metal silicide.
2 more elements
A micromechanical structure comprising:
- at least one stationary structure;
- and
- a movable structure movable relative to the stationary structure,
- wherein the movable structure and the stationary structure are composed substantially of silicon, and
- wherein at least one of the movable structure and the stationary structure has a superficial metal-silicide layer.
2 more elements
Dependencies are inferred from the claim text.