Photoprotecting/cosmetic compositions comprising benzotriazole and bis-resorcinyltriazine sunscreens

A topically applicable sunscreen/cosmetic composition suited for the photoprotection of human skin and/or hair, comprising an effective SPF-maintaining and water remanence-enhancing amount of combinatory immixture of (a) at least one benzotriazole first sunscreen compound having the structural formula (I):

• 17
• in which A is a hydrogen atom or a divalent radical —L—W—;
• n is 1,2, or 3;
• the radicals Y, which may be identical or different, are each a C1-C10 alkyl radical, a halogen atom, a C1-C10 alkoxy radical or a sulfonic group, with the proviso that, in the latter instance, two adjacent groups Y on the same aromatic nucleus can together form an alkylidenedioxy group in which the alkylidene moiety has 1 or 2 carbon atoms and with the further proviso that the radicals Y are other than a sulfonic group when A is other than a hydrogen atom;
• L is a divalent radical having the formula (II) below:
• 18
• in which X is O or NH;
• Z is a hydrogen atom or a C1-C4 alkyl radical;
• n is an integer ranging from 0 to 3, inclusive;
• m is 0 or 1;
• p is an integer ranging from 1 to 10, inclusive;
• W is a radical of formula (1), (2) or (3) below:
• 19
• or
• —Si(R)3 (3)
• in which the radicals R, which may be identical or different, are each a C1-C10 alkyl, phenyl or 3,3,3-trifluoropropyl radical, at least 80%, by number of the radicals R being methyl radicals;
• the radicals B, which may be identical or different, are each a radical R or the radical V having the following formula:
• 20
• in which Y, n and L are as defined above;
• r is an integer ranging from 0 to 50, inclusive, and s is an integer ranging from 1 to 20, inclusive, and, if s=0, then at least one of the two radicals B is a radical V;
• u is an integer ranging from 1 to 6, inclusive, and t is an integer ranging from 0 to 10, inclusive, with the proviso that t+u is greater than or equal to 3, and (b) at least one bis-resorcinyl second sunscreen compound, formulated into (c) a topically applicable, cosmetically acceptable vehicle, diluent or carrier therefor.

A topically applicable sunscreen/cosmetic composition suited for the photoprotection of human skin and/or hair, comprising an effective SPF-maintaining and water remanence-enhancing amount of combinatory immixture of (a) at least one benzotriazole first sunscreen compound and (b) at least one bis-resorcinyltriazine second sunscreen compound having the structural formula (III):

• 21
• in which (i) the radicals R1 and R2, which may be identical or different, are each a C3-C18 alkyl radical, a C2-C18 alkenyl radical, or a residue of formula —CH2—CH(OH)—CH2—OT1 wherein T1 is a hydrogen atom or a C1-C8 alkyl radical;
• (ii) the radicals R1 and R2, which may be identical or different, can also be a residue of formula (4) below:
• 22
• in which R6 is a covalent bond, a linear or branched C1-C4 alkyl radical, or a residue of formula —Cm1H2m1—or —Cm1 H2m1—O—wherein m1 is a number ranging from 1 to 4;
• P1 is a number ranging from 0 to 5;
• the radicals R7, R8 and R9, which may be identical or different, are each a C1-C18 alkyl radical, a C1-C18 alkoxy radical, or a residue of formula:
• 23
• in which R10 is a C1-C5 alkyl radical;
• A1 is a residue having one of the following formulae:
• 24
• in which R3 denotes a hydrogen atom, a C1-C10 alkyl radical, a radical of formula —(CH2CHR5—O)n1R11 wherein n1 is a number ranging from 1 to 16, R11 is a hydrogen atom or methyl radical or a residue of structure —CH2—CH(OH)—CH2OT1 wherein T1 is as defined above;
• R4 is a hydrogen atom, a metal cation M, a C1-C5 alkyl radical, or a residue of formula —(CH2)m2—OT1 wherein m2 is a number ranging from 1 to 4 and T1 is as defined above, and Q1 is a C1-C18 alkyl radical, formulated into (c) a topically applicable, cosmetically acceptable vehicle, diluent or carrier therefor.

A topically applicable sunscreen/cosmetic composition suited for the photoprotection of human skin and/or hair, comprising an effective SPF-maintaining and water remanence-enhancing amount of combinatory immixture of (a) at least one benzotriazole first sunscreen compound having the structural formula (I):

• 25
• in which A is a hydrogen atom or a divalent radical —L—W—;
• n is 1,2, or 3;
• the radicals Y, which may be identical or different, are each a C1-C10 alkyl radical, a halogen atom, a C1-C10 alkoxy radical or a sulfonic group, with the proviso that, in the latter instance, two adjacent groups Y on the same aromatic nucleus can together form an alkylidenedioxy group in which the alkylidene moiety has 1 or 2 carbon atoms and with the further proviso that the radicals Y are other than a sulfonic group when A is other than a hydrogen atom;
• L is a divalent radical having the formula (II) below:
• 26
• in which X is O or NH;
• Z is a hydrogen atom or a C1-C4 alkyl radical;
• n is an integer ranging from 0 to 3, inclusive;
• m is 0 or 1;
• p is an integer ranging from 1 to 10, inclusive;
• W is a radical of formula (1), (2) or (3) below:
• 27
• in which the radicals R, which may be identical or different, are each a C1-C10 alkyl, phenyl or 3,3,3-trifluoropropyl radical, at least 80%, by number of the radicals R being methyl radicals;
• the radicals B, which may be identical or different, are each a radical R or the radical V having the following formula:
• 28
• in which Y, n and L are as defined above;
• r is an integer ranging from 0 to 50, inclusive, and s is an integer ranging from 1 to 20, inclusive, and, if s=0, then at least one of the two radicals B is a radical V;
• u is an integer ranging from 1 to 6, inclusive, and t is an integer ranging from 0 to 10, inclusive, with the proviso that t+u is greater than or equal to 3, and (b) at least one bis-resorcinyltriazine second sunscreen compound, having the structural formula (III):
• 29
• in which (i) the radicals R1 and R2, which may be identical or different, are each a C3-C18 alkyl radical, a C2-C18 alkenyl radical, or a residue of formula —CH2—CH(OH)—CH2—OT1 wherein T1 is a hydrogen atom or a C1-C8 alkyl radical;
• (ii) the radicals R1 and R2, which may be identical or different, can also be a residue of formula (4) below:
• 30
• in which R6 is a covalent bond, a linear or branched C1-C4 alkyl radical, or a residue of formula —Cm1H2m1—or —Cm1 H2m1—O—wherein ml is a number ranging from 1 to 4;
• P1 is a number ranging from 0 to 5;
• the radicals R7, R8 and R9, which may be identical or different, are each a C1-C18 alkyl radical, a C1-C18 alkoxy radical, or a residue of formula:
• 31
• in which R10 is a C1-C5 alkyl radical;
• A1 is a residue having one of the following formulae:
• 32
• in which R3 denotes a hydrogen atom, a C1-C10 alkyl radical, a radical of formula —(CH2CHR5—O)n1R11 wherein n1 is a number ranging from 1 to 16, R11 is a hydrogen atom or methyl radical or a residue of structure —CH2—CH(OH)—CH2OT1 wherein T1 is as defined above;
• R4 is a hydrogen atom, a metal cation M, a C1-C5 alkyl radical, or a residue of formula —(CH2)m2—OT1 wherein m2 is a number ranging from 1 to 4 and T1 is as defined above, and Q1 is a C1-C18 alkyl radical, formulated into (c) a topically applicable, cosmetically acceptable vehicle, diluent or carrier therefor.