US 2002/0054425 A1 · Wavelength converting element and method of manufacture thereof

Abstract

A wavelength converting element is provided in which a fundamental wave with respect to an optical crystal substrate and a peak of a vertical transverse mode of a second harmonic are made to coincide, the converting efficiency is good, and a beam shape which enables good joining to a lens or an optical fiber is obtained. Given that an angle formed by a surface of the optical crystal substrate and a C axis of the optical crystal substrate is θ, a period at which inverted domains are formed is p, and a distance from a distal end of a comb-shaped electrode for forming the inverted domain to a central position of a waveguide is G, in the ion implantation, a concentration peak of the ion implantation is formed at a distance of substantially (G·tan θ+p/4) from the surface of the optical crystal substrate.

Claims14

Dependent claims

A wavelength converting element comprising:

an optical crystal substrate;
inverted domains formed at an interior of the optical crystal substrate;
and
a waveguide which is formed by ion implantation and which intersects the inverted domains.

1 more element

A method of manufacturing a wavelength converting element comprising the steps of:

forming inverted domains at an interior of an optical crystal substrate;
pattern-forming a metal film on the optical crystal substrate at which the inverted domains have been formed, such that at least a region at which a waveguide is to be formed is exposed;
applying a negative photoresist on the patterned metal film;
exposing the negative photoresist by using the patterned metal film as a mask, by irradiating ultraviolet light from a reverse surface of the optical crystal substrate to which the negative photoresist has been applied;
carrying out developing thereafter so as to form a resist pattern on the region at which the waveguide is to be formed;
forming a metal film by electroplating by using the patterned metal film as an electrode and by using the negative photoresist as a mask;
removing the negative photoresist thereafter;
carrying out ion implantation at portions of the optical crystal substrate from which the negative photoresist has been removed, by using the metal film formed by the electroplating as an ion implantation mask;
and
forming an optical waveguide by carrying out annealing thereafter.

7 more elements

Dependencies are inferred from the claim text.

Wavelength converting element and method of manufacture thereof

Life of this patent

Wavelength converting element and method of manufacture thereof

Life of this patent

Abstract

Claims14