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US 2002/0053880 A1Published application
Ion source and operation method thereof
AssigneeNissin Electric Co., Ltd.
InventorNaoki Miyamoto
Life of this patent
Estimating the term…
Abstract
In an ion source, a rear reflector 10 is electrically insulated from both a plasma production vessel 2 and a filament 6. The rear reflector 10 and an opposed reflector 8 are electrically connected. Further, a DC bias power supply 32 is a power supply individuated from a filament power supply 24 and an arc power supply 26. The DC bias power supply 32 is placed for applying a bias voltage VB between the opposed reflector 8 and the rear reflector 10 and the plasma production vessel 2 with both the reflectors 8 and 10 as negative potential.
Claims20
An ion source comprising:
- a plasma production vessel, into which gas is introduced, serving as a positive potential;
- a filament for emitting electrons, disposed in one side of said plasma production vessel and electrically insulated from said plasma production vessel;
- an opposed reflector for reflecting electrons, disposed facing said filament in an opposite side of said plasma production vessel and electrically insulated from said plasma production vessel;
- a rear reflector for reflecting electrons, disposed facing said opposed reflector in said plasma production vessel while sandwiched between said filament and the one side of said plasma production vessel, said rear reflector being electrically insulated from said plasma production vessel and said filament;
- a magnetic field generator for generating a magnetic field along an axis connecting said filament and said opposed reflector in said plasma production vessel;
- a filament power supply for heating said filament for emitting electrons;
- a DC arc power supply for applying a DC arc voltage between said filament and said plasma production vessel with the filament side as a negative potential for producing arc discharge between said filament and said plasma production vessel;
- and
- a DC bias power supply for applying a DC bias voltage between at least one of said opposed reflector and said rear reflector and said plasma production vessel with the reflector side as a negative potential, said bias power supply being individuated from said filament power supply and said arc power supply.
6 more elements
An ion source comprising:
- a plasma production vessel, into which gas is introduced, serving as a positive potential;
- first and second filaments for emitting electrons, disposed facing each other in said plasma production vessel and electrically insulated from said plasma production vessel;
- first and second rear reflectors for reflecting electrons, disposed facing each other while sandwiching said first and second filaments therebetween, said first and second rear reflectors being electrically insulated from said plasma production vessel and said first and second filaments;
- a magnetic field generator for generating a magnetic field along an axis connecting said first and second filaments in said plasma production vessel;
- a filament power supply for heating said first and second filaments for emitting electrons;
- a DC arc power supply for applying a DC arc voltage between said first and second filaments and said plasma production vessel with both filament sides as negative potential for producing arc discharge between both said filaments and said plasma production vessel;
- and
- a DC bias power supply for applying a DC bias voltage between at least one of said first and second rear reflectors and said plasma production vessel with the reflector side as a negative potential, said bias power supply being individuated from said filament power supply and said arc power supply.
5 more elements
Dependencies are inferred from the claim text.