Reduced topography DRAM cell fabricated using a modified logic process and method for operating same
AssigneeMonolithic System Technology, Inc.
InventorsWingyu Leung, Fu-Chieh Hsu
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AssigneeMonolithic System Technology, Inc.
InventorsWingyu Leung, Fu-Chieh Hsu
Estimating the term…
A memory system that includes a DRAM cell that includes an access transistor and a storage capacitor. The storage capacitor is fabricated by forming a polysilicon crown electrode, a dielectric layer overlying the polysilicon crown, and a polysilicon plate electrode overlying the dielectric layer. A first set of thermal cycles are performed during the formation of the storage capacitor to form and anneal the elements of the capacitor structure. Subsequently, shallow P+ and/or N+ regions are formed by ion implantation, and metal salicide is formed. As a result, the relatively high first set of thermal cycles required to form the capacitor structure does not adversely affect the shallow P+ and N+ regions or the metal salicide. A second set of thermal cycles, which are comparable to or less than the first set of thermal cycles, are performed during the formation of the shallow regions and the metal salicide.
A dynamic random access memory (DRAM) cell fabricated using a logic process, the DRAM cell comprising:
A dynamic random access memory (DRAM) cell comprising:
A memory system that operates in response to a positive supply voltage and a ground supply voltage, the memory system comprising:
A memory system that operates in response to a positive supply voltage and a ground supply voltage, the memory system comprising:
A memory system comprising:
Dependencies are inferred from the claim text.