Silica glass and its manufacturing method
AssigneeNikon Corporation
InventorsNorio Komine, Seishi Fujiwara, Hiroki Jinbo
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AssigneeNikon Corporation
InventorsNorio Komine, Seishi Fujiwara, Hiroki Jinbo
Estimating the term…
A method is provided for manufacturing a silica glass that is substantially free of chlorine. The method includes the step of separately expelling a silicon tetrafluoride gas, a combustion gas, and a combustible gas from a burner made of silica glass, the flow velocity of the silicon tetrafluoride gas being within the range of about 9 slm/cm2 to about 20 slm/cm2. The method further includes the steps of producing minute silica glass particles by reacting the silicon tetrafluoride gas with water produced by a reaction of the combustion gas with the combustible gas, depositing the minute silica glass particles on a target, and producing the silica glass by fusing and vitrifying the minute silica glass particles deposited on the target.
A silica glass that is substantially free of chlorine (Cl), including a fluorine (F) concentration of about 100 ppm to about 450 ppm, a difference between the maximum refractive index and the minimum refractive index of the silica glass (Δn) being within the range of about 1.0×10−7 to about 1.0×10−5.
A silica glass having a chlorine concentration of about 0.1 ppm or less and a fluorine concentration of about 100 ppm to about 450 ppm, the silica glass having a substantially uniform refractive index distribution with respect to ultraviolet light such that a difference between the maximum refractive index and the minimum refractive index is within the range of about 1.0×10−7 to about 1.0×10−5.
A method for manufacturing a silica glass that is substantially free of chlorine, comprising the steps of:
A method for manufacturing a silica glass, comprising the steps of:
Dependencies are inferred from the claim text.