Method for performing metallo-organic chemical vapor deposition of titanium nitride at reduced temperature

A method of processing a substrate comprising the steps of:

• (a) supporting said substrate upon a pedestal;
• (b) maintaining said substrate at a predetermined process temperature by a heating element embedded within said pedestal;
• (c) supplying to said chamber a metallo-organic compound containing titanium, a dilutant gas flow of at least about 500 sccm and a purge gas flow of at least about 500 sccm to produce a pressure of at least about 5 torr;
• (d) thermally decomposing said metallo-organic compound;
• and
• (e) forming a film comprising titanium nitride upon said substrate.

A method of processing a substrate comprising the step of:

• supplying to a chamber containing said substrate a metallo-organic compound, a dilutant gas, and a purge gas;
• directing a first purge gas flow towards an edge of said substrate;
• directing a second purge gas flow towards a bottom of an edge ring assembly that circumscribes said substrate;
• heating said substrate to cause thermal decomposition of said metallo-organic compound to form a film upon said substrate.