Method and apparatus for forming an optical multilayer filter
OwnerEmiko Nishida, Noboru Ueharainventors
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OwnerEmiko Nishida, Noboru Ueharainventors
Estimating the term…
In a film forming method for forming an optical multilayer filter by detecting the thickness of each layer by means of an optical thickness monitor (OTM) 15 and by controlling a film forming apparatus 11 based on the OTM detected output: the light source of the OTM 15 is formed by a variable wavelength light source whose wavelength is variable over the range of λ1 nm to λ2 nm, including λnm; the optical thickness of each of λ/4-oriented layers is optimized within the range of λ1/4 nm to λ2/4 nm; the wavelength of the variable wavelength light source 12 for each layer is selected so that its transmittance reaches an extreme value at the optical thickness of each layer; and the formation of each layer is stopped upon detection of the extreme value of the transmittance.
A film forming method for an optical multilayer filter having a predetermined number of layers in which the optical thickness of each of said layers of a λ/4-oriented structure is determined by its optimization in the neighborhood of λ/4, said method comprising the steps of:
A film forming apparatus for an optical multilayer filter having a predetermined number of layers in which the optical thickness of each of said layers of a λ/4-oriented structure is determined by its optimization in the neighborhood of λ/4, said apparatus comprising:
Dependencies are inferred from the claim text.