Back to results
US 2002/0001134 A1Published application
Illumination optical system in exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorKen-Ichiro Shinoda
Life of this patent
Estimating the term…
Abstract
Disclosed is an optical system including an internal reflection type optical member effective to change a direction of advancement of an approximately linearly polarized light on the basis of total reflection, and a depolarizing member for dissolving linear polarization of light emitted from the optical member.
Claims23
An optical system, comprising:
- an internal reflection type optical member effective to change a direction of advancement of an approximately linearly polarized light on the basis of total reflection;
- and
- a depolarizing member for dissolving linear polarization of light emitted from said optical member.
An illumination optical system, comprising:
- an internal reflection type optical member effective to change a direction of advancement of an approximately linearly polarized light on the basis of total reflection;
- and
- a depolarizing member for dissolving linear polarization of light emitted from said optical member.
An exposure apparatus, comprising:
- an illumination optical system including (i) an internal reflection type optical member effective to change a direction of advancement of an approximately linearly polarized light on the basis of total reflection, and (ii) a depolarizing member for dissolving linear polarization of light emitted from said optical member;
- and
- a projection optical system for projecting a pattern, formed on a surface to be illuminated by said illumination optical system, onto a substrate.
A device manufacturing method, comprising the steps of:
- illuminating a surface to be illuminated, by use of an illumination optical system which includes (i) an internal reflection type optical member effective to change a direction of advancement of an approximately linearly polarized light on the basis of total reflection, and (ii) a depolarizing member for dissolving linear polarization of light emitted from the optical member;
- and
- transferring a pattern, formed on the surface to be illuminated, onto a substrate by use of a projection optical system.
Dependencies are inferred from the claim text.