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US 2002/0000766 A1Published application
Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsHaruhito Ono, Takayuki Yagi
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Abstract
An electron optical system of this invention includes, e.g., an upper electrode having a plurality of apertures, a plurality of middle electrodes having a plurality of aligned apertures, a lower electrode having a plurality of apertures, and a shield interposed between adjacent middle electrodes.
Claims23
An electron optical system having a plurality of electron lenses, comprising:
- a plurality of electrodes which have apertures for transmitting a charged-particle beam and are arranged in one plane;
- and
- a shield interposed between said adjacent electrodes.
An electron optical system having a plurality of electron lenses, comprising:
- an upper electrode having a plurality of apertures;
- a plurality of middle electrodes each having an aperture;
- a lower electrode having a plurality of apertures;
- and
- a shield interposed between said adjacent middle electrodes,
- wherein said upper electrode, middle electrodes, and lower electrode are arranged along an optical axis.
3 more elements
An electron optical system having a plurality of electron lenses, comprising:
- a first electron optical system array having electrodes with a plurality of rectangular apertures;
- and
- a second electron optical system array having electrodes with a plurality of rectangular apertures, said first and second electron optical system arrays being arranged along an optical axis,
- wherein a long side of each aperture of said first electron optical system array is perpendicular to a long side of each aperture of said second electron optical system array.
1 more element
A charged-particle beam exposure apparatus comprising:
- a charged-particle source for emitting a charged-particle beam;
- a first electron optical system which has a plurality of electron lenses and forms a plurality of intermediate images of said charged-particle source by the plurality of electron lenses;
- and
- a second electron optical system for projecting on a substrate the plurality of intermediate images formed by said first electron optical system,
- said first electron optical system including:
- a plurality of electrodes which have apertures for transmitting the charged-particle beam and are arranged in one plane;
- and
- a shield interposed between said adjacent electrodes.
5 more elements
A charged-particle beam exposure apparatus comprising:
- a charged-particle source for emitting a charged-particle beam;
- a first electron optical system which has a plurality of electron lenses and forms a plurality of intermediate images of said charged-particle source by the plurality of electron lenses;
- and
- a second electron optical system for projecting on a substrate the plurality of intermediate images formed by said first electron optical system,
- said first electron optical system including:
- an upper electrode having a plurality of apertures;
- a plurality of middle electrodes each having an aperture;
- a lower electrode having a plurality of apertures;
- and
- a shield interposed between said adjacent middle electrodes,
- wherein said upper electrode, middle electrodes, and lower electrode are arranged along an optical axis.
8 more elements
A charged-particle beam exposure apparatus comprising:
- a charged-particle source for emitting a charged-particle beam;
- a first electron optical system which has a plurality of electron lenses and forms a plurality of intermediate images of said charged-particle source by the plurality of electron lenses;
- and
- a second electron optical system for projecting on a substrate the plurality of intermediate images formed by said first electron optical system,
- said first electron optical system including:
- a first electron optical system array having electrodes with a plurality of rectangular apertures;
- and
- a second electron optical system array having electrodes with a plurality of rectangular apertures, said first and second electron optical system arrays being arranged along an optical axis,
- wherein a long side of each aperture of said first electron optical system array is perpendicular to a long side of each aperture of said second electron optical system array.
6 more elements
A device manufacturing method comprising the steps of:
- installing a plurality of semiconductor manufacturing apparatuses including a charged-particle beam exposure apparatus in a factory;
- and
- manufacturing a semiconductor device by using the plurality of semiconductor manufacturing apparatuses,
- the charged-particle beam exposure apparatus having:
- a charged-particle source for emitting a charged-particle beam;
- a first electron optical system which has a plurality of electron lenses and forms a plurality of intermediate images of the charged-particle source by the plurality of electron lenses;
- and
- a second electron optical system for projecting on a substrate the plurality of intermediate images formed by the first electron optical system,
- the first electron optical system including:
- a plurality of electrodes which have apertures for transmitting the charged-particle beam and are arranged in one plane;
- and
- a shield interposed between the adjacent electrodes.
9 more elements
A semiconductor manufacturing factory comprising:
- a plurality of semiconductor manufacturing apparatuses including a charged-particle beam exposure apparatus;
- a local area network for connecting said plurality of semiconductor manufacturing apparatuses;
- and
- a gateway for connecting the local area network to an external network of said semiconductor manufacturing factory,
- said charged-particle beam exposure apparatus having:
- a charged-particle source for emitting a charged-particle beam;
- a first electron optical system which has a plurality of electron lenses and forms a plurality of intermediate images of the charged-particle source by the plurality of electron lenses;
- and
- a second electron optical system for projecting on a substrate the plurality of intermediate images formed by said first electron optical system,
- said first electron optical system including:
- a plurality of electrodes which have apertures for transmitting the charged-particle beam and are arranged in one plane;
- and
- a shield interposed between said adjacent electrodes.
10 more elements
A maintenance method for a charged-particle beam exposure apparatus, comprising the steps of:
- preparing a database for storing information about maintenance of the charged-particle beam exposure apparatus on an external network of a factory where the charged-particle beam exposure apparatus is installed;
- connecting the charged-particle beam exposure apparatus to a local area network in the factory;
- and
- maintaining the charged-particle beam exposure apparatus on the basis of the information stored in the database by using the external network and the local area network,
- the charged-particle beam exposure apparatus having:
- a charged-particle source for emitting a charged-particle beam;
- a first electron optical system which has a plurality of electron lenses and forms a plurality of intermediate images of the charged-particle source by the plurality of electron lenses;
- and
- a second electron optical system for projecting on a substrate the plurality of intermediate images formed by the first electron optical system,
- the first electron optical system including:
- a plurality of electrodes which have apertures for transmitting the charged-particle beam and are arranged in one plane;
- and
- a shield interposed between the adjacent electrodes.
10 more elements
Dependencies are inferred from the claim text.