Silicon nitride composite hdp/cvd process
OwnerLie-Yea Cheng, Chiu Chan +1inventors
InventorsLIE-YEA CHENG, CHIU CHAN, FARHAD K. MOGHADAM
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Abstract
The present invention provides a method for forming a barrier film on a substrate by depositing a first dielectric film, such as a tetra-ethyl-ortho-silicate (TEOS) film, on a substrate and depositing a silicon nitride film over the dielectric film. Preferably, the method further comprises depositing a silicate glass film over the barrier film. The present invention further provides a semiconductor device comprising: a polysilicon substrate; a dielectric film deposited over the polysilicon substrate; a silicon nitride film deposited over the dielectric film; a silicate glass film deposited over the silicon nitride film; and a metal film deposited selectively over the silicate glass film.
Claims19
A barrier film comprising:
- a) a first dielectric film;
- and
- b) a silicon nitride film deposited over the first dielectric film.
A semiconductor device comprising:
- a) a polysilicon substrate;
- b) a dielectric film deposited over the polysilicon substrate;
- c) a silicon nitride film deposited over the dielectric film;
- d) a silicate glass film deposited over the silicon nitride film;
- and
- e) a metal film deposited selectively over the silicate glass layer.
A method of producing a semiconductor device on a substrate, comprising:
- a) depositing a first dielectric film over the substrate;
- b) depositing a silicon nitride film over the dielectric film;
- c) depositing a silicate glass film over the silicon nitride film;
- d) etching a via through the silicate glass, the silicon nitride and the dielectric films;
- e) depositing a metal interconnect in the via;
- f) depositing a metal film over the silicate glass film;
- g) etching away a section of the metal film to expose a section of the silicate glass film;
- and
- h) depositing a silicon oxide film over the silicate glass film and the metal film using high density plasma chemical vapor deposition techniques.
Dependencies are inferred from the claim text.