Surface position detection device and exposure apparatus and exposure method achieved by utilizing detection device

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, wherein:
• the surface position of the detection target surface is detected based upon an output from said light-receiving system.

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other and constituted of a low-dispersion optical material with an Abbe number of 65 or higher, wherein:
• the surface position of the detection target surface is detected based upon an output from said light-receiving system.

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, wherein:
• said prism includes a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted;
• and
• the surface position of the detection target surface is detected based upon an output from said light-receiving system.

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, wherein:
• said prism includes a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted and is constituted of a low-dispersion optical material with an Abbe number of 65 or higher;
• and
• the surface position of the detection target surface is detected based upon an output from said light-receiving system.

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, wherein:
• said prism includes a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of sad prism is transmitted, with the angle formed by said first reflection surface and said second reflection surface set within a range of 40° or more and less than 45°;
• and
• the surface position of the detection target surface is detected based upon an output from said light-receiving system.

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, wherein:
• said prism includes a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted, with the angle formed by said first reflection surface and said second reflection surface set within a range of 40° or more and less than 45° and is constituted of a low-dispersion optical material with an Abbe number of 65 or higher;
• and
• the surface position of the detection target surface is detected based upon an output from said light-receiving system.

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a prier image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, wherein:
• the surface position of the detection target surface is detected based upon an output from said detection unit.

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, wherein:
• the surface position of the detection target surface is detected based upon an output from said detection unit.

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other and constituted of a low-dispersion optical material with an Abbe number of 65 or higher, wherein:
• the surface position of the detection target surface is detected based upon an output from said detection unit.

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of sad projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, wherein:
• said prism includes a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted;
• and
• the surface position of the detection target surface is detected based upon an output from said detection unit.

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, wherein:
• said prism includes a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted and is constituted of a low-dispersion optical material with an Abbe number of 65 or higher;
• and
• the surface position of the detection target surface is detected based upon an output from said detection unit.

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, wherein:
• said prism includes a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical, path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted, with the angle formed by said first reflection surface and said second reflection surface set within a range of 40° or more and less than 45°;
• and
• the surface position of the detection target surface is detected based upon an output from said detection unit.

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, wherein:
• said prism includes a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted, with the angle formed by said first reflection surface and said second reflection surface set within a range of 40° or more and less than 45° and is constituted of a low-dispersion optical material with an Abbe number of 65 or higher;
• and
• the surface position of the detection target surface is detected based upon an output from said detection unit.

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a pair of reflection mirrors that are not parallel to each other and holding members each provided to interfit with and hold one of said pair of reflecting mirrors, wherein:
• the surface position of the detection target surface is detected based upon an output from said light-receiving system.

A surface position detection device for detecting a surface position of a detection target surface, comprising;

• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a pair of reflection mirrors that are not parallel to each other and holding members each provided to interfit with and hold one of said pair of reflecting mirrors;
• wherein
• the surface position of the detection target surface is detected based upon an output from said detection unit.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux;
• to detect the surface position of the detection target surface is based upon an output from said light-receiving system;
• and
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other;
• to detect the surface position of the detection target surface is detected based upon an output from said light-receiving system;
• and
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other and constituted of a low-dispersion optical material with an Abbe number of 65 or higher;
• to detect the surface position of the detection target surface based upon a output from said light-receiving system and;
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, with said prism having a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted;
• to detect the surface position of the detection target surface based upon an output from said light-receiving system and;
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes,
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, with said prism having a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted and constituted of a low-dispersion optical material with an Abbe number of 65 or higher;
• to detect the surface position of the detection target surface is detected based upon an output from said light-receiving system and;
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, with said prism having a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted and the angle formed by said first reflection surface and said second reflection surface set within a range of 40° or greater and less than 45°;
• to detect the surface position of the detection target surface is detected based upon an output from said light-receiving system and;
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device tat detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, with said prism having a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of sad prism is transmitted, the angle formed by said first reflection surface and said second reflection surface set within a range of 40° or greater and less than 45° and said prism is constituted of a low-dispersion optical material with an Abbe number of 65 or greater;
• to detect the surface position of the detection target surface based upon an output from said light-receiving system and;
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing a light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux;
• to detect the surface position of the detection target surface based upon an output from said detection unit and;
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing a light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other;
• to detect the surface position of the detection target surface based upon an output from said detection unit and;
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to sad projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing a light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other and constituted of a low-dispersion optical material with an Abbe number of 65 or higher;
• to detect the surface position of the detection target surface based upon an output from said detection unit and;
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing a light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, with said prism having a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted;
• to detect the surface position of the detection target surface based upon an output from said detection unit and;
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing a light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, with said prism having a first transmission surface through which the incident, light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted and constituted of a low-dispersion optical material with an Abbe number of 65 or higher;
• to detect the surface position of the detection target surface based upon an output from said detection unit and;
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing a light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, with said prism having a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted and the angle formed by said first reflection surface and said second reflection surface set within a range of 40° or greater and less than 45°;
• to detect the surface position of the detection target surface based upon an output from said detection unit and;
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing a light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, with said prism having a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted, the angle formed by said first reflection surface and said second reflection surface set within a range of 40° or greater and less than 45° and said prism is constituted of a low-dispersion optical material with an Abbe number of 65 or greater;
• to detect the surface position of the detection target surface based upon an output from said detection unit and;
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a pair of reflection mirrors that are not parallel to each other and holding members each provided to interfit with and hold one of said pair of reflecting mirrors;
• to detect the surface position of the detection target surface based upon an output from said light-receiving system;
• and
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure apparatus that performs projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a surface position detection device that detects a surface position of the pattern surface at the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system as a surface position of a detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a pair of reflection mirrors that are not parallel to each other and holding members each provided to interfit with and hold one of said pair of reflecting mirrors;
• to detect the surface position of the detection target surface based upon an output from said detection unit;
• and
• a means for alignment that aligns the pattern surface at the mask or the exposure target surface of the photosensitive substrate relative to said projection optical system based upon results of a detection performed by said surface position detection device.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of sad projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux;
• to detect the surface position of the detection target surface based upon an output from said light-receiving system;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other;
• to detect the surface position of the detection target surface based upon an output from said light-receiving system;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at au angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other and constituted of a low-dispersion optical material with an Abbe number of 65 or higher;
• to detect the surface position of the detection target surface based upon an output from said light-receiving system;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, with said prism having a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted;
• to detect the surface position of the detection target surface based upon an output from said light-receiving system;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted, and constituted of a low-dispersion optical material with an Abbe number of 65 or higher;
• to detect the surface position of the detection target surface based upon an output from said light-receiving system;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted, and the angle formed by said first reflection surface and said second reflection surface set within a range of 40° or greater and less than 45°;
• to detect the surface position of the detection target surface based upon an output from said light-receiving system;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon the results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prism is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted, and the angle formed by said first reflection surface and said second reflection surface set within a range of 40° or greater and less than 45° and said prism is constituted of a low-dispersion optical material with an Abbe number of 65 or higher;
• to detect the surface position of the detection target surface based upon an output from said light-receiving system;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon the results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux;
• to detect the surface position of the detection target surface based upon an output from said detection unit;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux which includes a prism having a pair of reflection surfaces that are not parallel to each other;
• to detect the surface position of the detection target surface based upon an output from said detection unit;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other and constituted of a low-dispersion optical material with an Abbe number of 65 or higher;
• to detect the surface position of the detection target surface based upon an output from said detection unit;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux which includes a prism having a pair of reflection surfaces that are not parallel to each other, a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted;
• to detect the surface position of the detection target surface based upon an output from said detection unit;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted, and constituted of a low-dispersion optical material with an Abbe number of 65 or higher;
• to detect the surface position of the detection target surface based upon an output from said detection unit;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted, and the angle formed by said first reflection surface and said second reflection surface set within a range of 40° or greater and less than 45°;
• to detect the surface position of the detection target surface based upon an output from said detection unit;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a prism having a pair of reflection surfaces that are not parallel to each other, a first transmission surface through which the incident light flux is transmitted, a first reflection surface at which the light flux having been transmitted through said first transmission surface and propagated through the inside of said prism is reflected, a second reflection surface at which the light flux having been reflected at said first reflection surface and propagated through the inside of said prim is reflected along an optical path intersecting the optical path of the light flux having been transmitted through said first transmission surface and a second transmission surface through which the light flux having been reflected at said second reflection surface and propagated through the inside of said prism is transmitted, and the angle formed by said first reflection surface and said second reflection surface set within a range of 40° or greater and less than 45° and said prism is constituted of a low-dispersion optical material with an Abbe number of 65 or higher;
• to detect the surface position of the detection target surface based upon an output from said detection unit;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a pair of reflection mirrors that are not parallel to each other and holding members each provided to interfit with and hold one of said pair of reflecting mirrors;
• to detect the surface position of the detection target surface based upon an output from said light-receiving system;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon results of a detection performed in said detection step.

An exposure method for implementing projection exposure of a pattern formed at a mask onto a photosensitive substrate via a projection optical system, comprising;

• a detection step in which the surface position of a pattern surface of the mask or an exposure target surface of the photosensitive substrate relative to said projection optical system is detected as a surface position of a detection target surface by employing a surface position detection device that detects the surface position of the detection target surface and includes;
• a projection system that projects a light flux from a diagonal direction onto the detection target surface and includes a projection optical system provided to form a primary image of a specific pattern onto the detection target surface;
• a light-receiving system that receives a light flux having been reflected at the detection target surface and includes a condenser optical system provided to form a secondary image of the specific pattern by condensing the light flux having been reflected at the detection target surface and a detection unit provided to detect the secondary image of the specific pattern formed via said condenser optical system;
• and
• a means for light flux deflection provided, at least, either in an optical path of said projection system or in an optical path of said light-receiving system and having an even number of reflection surfaces to allow an incident light flux to exit at an angle that is not parallel to the incident light flux, which includes a pair of reflection mirrors that are not parallel to each other and holding members each provided to interfit with and hold one of said pair of reflecting mirrors;
• to detect the surface position of the detection target surface based upon an output from said detection unit;
• and
• an alignment step in which the pattern surface of the mask or the exposure target surface of the photosensitive substrate is aligned relative to said projection optical system based upon results of a detection performed in said detection step.