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US 2002/0000029 A1Published application
Pipe structure, alignment apparatus, electron beam lithography apparatus, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory
AssigneeCanon Kabushiki Kaisha
InventorKeiji Emoto
Life of this patent
Estimating the term…
Abstract
A pipe connected to a stage serving as a movable member arranged in a vacuum chamber has a double pipe structure constituted by a resin inner pipe and a resin outer pipe which covers the inner pipe including its surrounding space. The space between the inner pipe and the outer pipe is connected to a vacuum pump serving as an exhaust means. The space in the pipe is kept in vacuum by the vacuum pump.
Claims25
A pipe structure comprising:
- a double pipe having a resin inner pipe and a resin outer pipe covering an outside of the inner pipe;
- and
- a discharge mechanism for discharging fluid in a space between the inner pipe and the outer pipe.
A pipe structure comprising:
- a double pipe having at least one inner pipe and/or at least one electric wire and a resin outer pipe covering outsides of the inner pipe and/or the electric wire;
- and
- a discharge mechanism for discharging fluid in a space between the inner pipe and/or the electric wire and the outer pipe.
Dependencies are inferred from the claim text.