Apparatus and method for metal layer streched conducting plugs
OwnerSudhir K. Madaninventor
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Abstract
To provide a conducting path between the metal—0 layer and a metal—1 interconnect layer, two layers with conducting plugs were necessary in the prior art. In the present invention, the conducting regions electrically coupling two regions of the integrated circuit are formed at the same time as the formation of the conducting plugs coupling selected portions of the integrated circuit with the metal—1 interconnect layer. The conducting regions, as with the conducting plugs, extend to surface of the insulating layer upon which the metal—1 interconnect paths are patterned. Using this technique, process steps required in the prior art can be eliminated. This process has the limitation that the metal—1 interconnect layer can not be formed over the conducting regions.
Claims14
A metal interconnect structure for providing a conducting path between electrically isolated conducting regions in an integrated circuit, said conducting regions having an insulating layer formed thereon, said structure comprising:
- a first conducting layer comprising a plurality of conducting plugs of first conducting material formed through said insulating layer, said plugs forming an electrical contact with said electrically isolated conducting regions, wherein at least one of said plugs forms an electrical contact with at least two of said isolated conducting regions;
- and
- a patterned layer of a second conducting material formed on said insulating layer, said patterned layer electrically coupling selected plugs.
The method of forming a metal interconnect structure in an integrated circuit device, said integrated circuit device having a electrically conducting isolated regions formed thereon, said method comprising the steps of:
- forming an insulating layer on said electrically conducting isolated regions;
- forming holes through said insulating layer exposing selected electrically conducting isolated regions, wherein at least one of the holes exposes at least two electrically conducting isolated regions;
- forming a first conducting layer by filling said holes with a conducting material to form conducting plugs;
- forming and patterning a second conducting layer on said first conducting layer and said insulating layer, said second conducting layer electrically coupling preselected conducting plugs.
Dependencies are inferred from the claim text.