Method for manufacturing optical element, optical element, optical system using optical element, optical apparatus and exposure apparatus using optical system, and method for manufacturing device
AssigneeCanon Kabushiki Kaisha
InventorKeiko Chiba
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Abstract
The present invention provides a method for manufacturing an optical element to be used for an optical system and an optical instrument using the optical system, and a method for manufacturing a device using the optical instrument, wherein the optical element is manufactured by the steps including the steps for processing a high purity silica glass by lithography, and the hydrogen molecule content is adjusted after manufacturing the optical element.
Claims55
A method for manufacturing an optical element comprising the steps of:
- processing a high purity synthetic silica glass by lithography;
- and
- allowing the silica glass to contain hydrogen,
- wherein the lithography process comprises resist process, exposure, development and etching.
A method for manufacturing an optical element comprising the steps of:
- processing the a high purity synthetic silica glass by lithography;
- and
- allowing the silica glass to contain hydrogen gas before processing the silica glass.
A method for manufacturing an optical element comprising the steps of:
- processing a high purity synthetic silica glass by lithography,
- wherein the lithography process comprises a dry etching step, the dry etching step being carried out in an etching gas added hydrogen has.
Dependencies are inferred from the claim text.