Exposure method and exposure apparatus
AssigneeNikon Corporation
InventorsNobuyuki Irie, Nobutaka Magome
Life of this patent
Estimating the term…
Abstract
An exposure method which irradiates a slit-shaped illumination light IL on a reticle Ri and a substrate while moving them synchronously so as to sequentially transfer images of patterns formed on the reticle Ri to the substrate 4, wherein a density filter Fj having an attenuating part for gradually reducing the distribution of illuminance of the illumination light IL is moved in synchronization with the movement of the reticle Ri.
Claims35
An exposure method which irradiates a slit-shaped energy beam on a mask and a sensitive object while moving them synchronously so as to sequentially transfer images of patterns formed on the mask to the sensitive object, including
- a step of moving a density filter having a attenuating part for gradually reducing an amount of energy of the energy beam in sychronization with the movement of the mask.
An exposure method which relatively moves a mask and a sensitive object with respect to an energy beam and scans and exposes the sensitive object by the energy beam through the mask, including
- a step of gradually reducing an amount of energy in a part of an area irradiated by the energy beam on the sensitive object in a first direction in which the sensitive object is moved, while relatively moving a slope part where the amount of energy is gradually reduced in the first direction in said irradiated area during the scan exposure.
An exposure apparatus which irradiates a slit-shaped energy beam on a mask and a sensitive object while moving them synchronously so as to sequentially transfer images of patterns formed on the mask to the sensitive object, comprising
- a density filter which adjusts the distribution of energy of the energy beam and
- a filter stage which moves the density filter in synchronization with the mask.
An exposure apparatus comprising:
- a mask stage which moves a mask,
- a substrate stage which moves a substrate,
- an illumination optical system which irradiates a slit-shaped energy beam,
- a filter stage which moves a density filter having an attenuating part for gradually reducing an amount of energy of said energy beam and
- a controller which controls said mask stage, said substrate stage, and said filter stage so that said substrate and said density filter move synchronously with respect to said energy beam.
An exposure apparatus which relatively moves a mask and a sensitive object with respect to an energy bean and scans and exposes the sensitive object by the energy beam through the mask, comprising:
- a density filter which gradually reduces an amount of energy in a part of an area irradiated by the energy beam on the sensitive object in a first direction in which the sensitive object is moved and
- an adjuster which shifts a slope part where the amount of energy is gradually reduced in the first direction in said irradiated area during the scan exposure.
An exposure apparatus in which a mask and a sensitive object are moved relative to an energy beam and the sensitive object is scanned exposed by the energy beam through the mask, comprising:
- a first optical unit which defines the width of an area irradiated by the energy beam on the sensitive object in a first direction in which the sensitive object is moved during the scan exposure;
- and
- a second optical unit which gradually reduces an amount of energy in a part of the irradiated area in the first direction, while shifting a slope part which the amount of energy is gradually reduced in the first direction within the irradiated area during the scan exposure.
Dependencies are inferred from the claim text.