Method of fabricating thermal head
AssigneeFuji Photo Film Co., Ltd.
InventorsMakoto Kashiwaya, Junji Nakada
Life of this patent
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Abstract
The thermal head fabricating method forms a lower protective layer made of ceramics for protecting a plurality of heat-generating resistors and electrodes, subjects the lower protective layer to etching processing by a plasma and forms a carbon protective layer on the thus subjected lower protective layer. The etching processing is performed using a mask which defines an area where the carbon protective layer is formed, a protective layer is formed on a surface of the mask, and the protective layer is made of a material which is etched at an extremely slow rate or substantially not etched compared with ceramics composing the lower protective layer and/or which does not impart an adverse effect to the carbon protective layer that is subsequently formed.
Claims3
A method of fabricating a thermal head, comprising the steps of:
- forming a lower protective layer comprising ceramics for protecting a plurality of heat-generating resistors and electrodes;
- subjecting said lower protective layer to etching processing by a plasma;
- and
- forming a carbon protective layer on the thus subjected lower protective layer,
- wherein said etching processing is performed using a mask which defines an area where said carbon protective layer is formed, a protective layer is formed on a surface of said mask, and said protective layer is made of a material which is etched at an extremely slow rate or substantially not etched compared with ceramics composing said lower protective layer and/or which does not impart an adverse effect to said carbon protective layer that is subsequently formed.
Dependencies are inferred from the claim text.