Method for forming microlenses with high light transmittance in image sensor
OwnerKi-Yeop Park, Sang-Gil Baeinventors
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Abstract
There is provided a method for forming microlenses in an image sensor having high light transmittance in short wavelength regions of visible lights, the method comprising: depositing a resist film for microlens over a predetermined substrate; selectively first-exposing the resist film to light in a range of exposure wavelengths and developing it to form resist patterns; second-exposing the remaining resist patterns to light photochemically to decompose an active form of sensitisizer remained in the resist patterns into an inactive form; and heating and flowing the resist patterns to form microlenses.
Claims6
A method for forming microlenses in an image sensor, comprising:
- depositing a resist film for microlens on a predetermined substrate;
- selectively first-exposing the resist film to light in a range of exposure wavelengths and developing it to form resist patterns;
- second-exposing the remaining resist patterns to light photochemically to decompose an active form of sensitisizer remained in the resist patterns into an inactive form;
- and
- heating and flowing the resist patterns to form microlenses.
Dependencies are inferred from the claim text.