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US 2001/0044072 A1Published application
Photoresist compositions comprising blends of ionic and non-ionic photoacid generators
AssigneeShipley Company, L.L.C.
InventorPeter Trefonas III
Life of this patent
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Abstract
The invention provides new photoresist compositions that contain a resin binder and a blend of non-ionic and ionic PAGS. Preferred resists of the invention preferably are imaged with 248 nm and/or 193 nm exposure wavelengths to provide highly resolved small dimension features.
Claims22
A photoresist composition comprising:
- a resin binder and a mixture of photoacid generator compounds in an amount sufficient to permit development of an exposed coating layer of the composition,
- the photoacid generator compound mixture comprising at least one photoacid generator that is an ionic compound and at least one photoacid generator that is a non-ionic compound.
The photoresist of claim I wherein the resin binder comprises an alkyl acrylate-phenol copolymer.
Dependencies are inferred from the claim text.