Surface treated vacuum material and a vacuum chamber having an interior surface comprising same
AssigneeAnelva Corporation
InventorYoshiro Shiokawa
Life of this patent
Estimating the term…
Abstract
A method for the surface treatment of vacuum materials reduces the H2O sticking probability on the surface of the vacuum material. The H2O sticking probability is reduced by selectively depositing silicon oxide, for example, and covering the regions which are in an active state on the surface of the vacuum material, and by setting the coverage to less than 100% of the state where film formation is achieved. If the abovementioned coverage is within the range from 40 to 80%, then it is possible to reduce the H2O sticking probability to a minimum.
Claims23
A method for surface treating a vacuum material, comprising depositing a substantially uniform distribution of a substance on the vacuum material so that less than 100% of the vacuum material on which the distribution is made is covered by the substance so that an H2O sticking probability of the vacuum material is reduced.
A surface treated vacuum material, comprising:
- a surface;
- and
- a deposited layer on the surface, the deposited layer including a substantially uniformly distribution of molecules covering less than 100% of the surface over which the molecules are substantially uniformly distributed.
Dependencies are inferred from the claim text.