Illuminator, exposure apparatus, and method for fabricating device using the same
AssigneeCanon Kabushiki Kaisha
InventorsHIDEO KATO, HIROSHI MAEHARA
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Abstract
In a projection aligner for illuminating a pattern on a mask with a luminous flux from a light source through an illumination system and projecting the pattern onto a wafer with a projection optical system, a titanium oxide (TiO2) film is provided on the surface of at least one unit constituting the projection aligner. Thus, contamination of the projection aligner can be prevented.
Claims34
An illuminator for illuminating a surface to be illuminated with a luminous flux from a light source through an illumination system, wherein a titanium oxide film is provided on the surface of at least one unit constituting said illumination system.
An illuminator for illuminating a surface to be illuminated with a luminous flux from a light source through an illumination system, wherein a titanium oxide film is provided in at least one region of at least one optical unit among a plurality of optical units.
An illuminator for illuminating a surface to be illuminated with a luminous flux from a light source through an illumination system, wherein a titanium oxide film is provided in at least one region of a supporting unit for supporting an optical unit.
An exposure apparatus for illuminating a pattern on a mask with a luminous flux from a light source through an illumination system and exposing a wafer with said pattern, wherein a titanium oxide film is provided on the surface of at least one unit.
An exposure apparatus for illuminating a pattern on a mask with a luminous flux from a light source through an illumination system and exposing a wafer with said pattern, wherein a titanium oxide film is provided on the surface of at least one region of at least one optical unit among a plurality of optical units.
An exposure apparatus for illuminating a pattern on a mask with a luminous flux from a light source through an illumination system and exposing a wafer with said pattern, wherein a titanium oxide film is provided on the surface of at least one region of a supporting unit for supporting at least one optical unit.
A projection aligner for illuminating a pattern on a mask with a luminous flux from a light source through an illumination system and projecting said pattern onto a wafer by a projection optical system, wherein a titanium oxide film is provided on the surface of at least one unit.
A projection aligner for illuminating a pattern on a mask with a luminous flux from a light source through an illumination system and projecting said pattern onto a wafer by a projection optical system, wherein a titanium oxide film is provided on the surface of at least one region of at least one optical unit among a plurality of optical units.
A projection aligner for illuminating a pattern on a mask with a luminous flux from a light source through an illumination system and projecting said pattern onto a wafer by a projection optical system, wherein a titanium oxide film is provided on the surface of at least one region of a supporting unit for supporting at least one optical unit.
Dependencies are inferred from the claim text.