Method of polymerization

A polymerization process comprising combining in the gas or slurry phase an olefin with an activator, a support and a compound represented by the following formula:

• 9
• wherein
• M is a group 3 to 14 metal,
• each X is independently an anionic leaving group,
• n is the oxidation state of M,
• m is the formal charge of the YZL ligand,
• Y is a group 15 element,
• Z is a group 15 element,
• L is a group 15 or 16 element,
• R1 and R2 are independently a C1 to C20 hydrocarbon group, a heteroatom containing group, silicon, germanium, tin, lead, phosphorus, a halogen,
• R1 and R2 may also be interconnected to each other,
• R3 is absent, or is hydrogen, a group 14 atom containing group, a halogen, a heteroatom containing group,
• R4 and R5 are independently an aryl group, a substituted aryl group, a cyclic alkyl group, a substituted cyclic alkyl group, or multiple ring system,
• R6 and R7 are independently absent or hydrogen, halogen, a heteroatom or a hydrocarbyl group, or a heteroatom containing group, provided however that L is bound to one of Y or Z and one of R1 or R2 is bound to L and not to Y or Z.

A process to produce a film comprising extruding, blowing or casting a film from polymer produced by a polymerization process comprising combining an olefin in the gas or slurry phase with an activator, a support and a compound represented by the following formula:

• 10
• wherein
• M is a group 3 to 14 metal,
• each X is independently an anionic leaving group,
• n is the oxidation state of M,
• m is the formal charge of the YZL ligand,
• Y is a group 15 element,
• Z is a group 15 element,
• L is a group 15 or 16 element,
• R1 and R2 are independently a C1 to C20 hydrocarbon group, a heteroatom containing group, silicon, germanium, tin, lead, phosphorus, a halogen,
• R1 and R2 may also be interconnected to each other,
• R3 is absent, or is hydrogen, a group 14 atom containing group, a halogen, a heteroatom containing group,
• R4 and R5 are independently an aryl group, a substituted aryl group, a cyclic alkyl group, a substituted cyclic alkyl group, or multiple ring system,
• R6 and R7 are independently absent or hydrogen, halogen, a heteroatom or a hydrocarbyl group, or a heteroatom containing group.

A composition represented by the formula:

• 13
• wherein
• M is a group 3 to 14 metal,
• each X is independently an anionic leaving group,
• n is the oxidation state of M,
• m is the formal charge of the YZL ligand,
• Y is a group 15 element,
• Z is a group 15 element,
• L is a group 15 or 16 element,
• R1 and R2 are independently a C1 to C20 hydrocarbon group, a heteroatom containing group, silicon, germanium, tin, lead, phosphorus, a halogen,
• R1 and R2 may also be interconnected to each other,
• R3 is absent, or is hydrogen, a group 14 atom containing group, a halogen, a heteroatom containing group,
• R4 and R5 are independently an aryl group, a substituted aryl group, a cyclic alkyl group, a substituted cyclic alkyl group, or multiple ring system,
• R6 and R7 are independently absent or hydrogen, halogen, a heteroatom or a hydrocarbyl group, or a heteroatom containing group.