Carrier head with a flexible membrane for a chemical mechanical polishing system
AssigneeApplied Materials, Inc., a Delaware corporation
InventorsIlya Perlov, Eugene Gantvarg, Sen-Hou Ko
Life of this patent
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AssigneeApplied Materials, Inc., a Delaware corporation
InventorsIlya Perlov, Eugene Gantvarg, Sen-Hou Ko
Estimating the term…
A carrier head with a flexible member connected to a base to define a first chamber, a second chamber and a third chamber. A lower surface of the flexible member provides a substrate receiving surface with an inner portion associated with the first chamber, a substantially annular middle portion surrounding the inner portion and associated with the second chamber, and a substantially annular outer portion surrounding the middle portion and associated with the third chamber. The width of the cuter portion may be significantly less than the width of the middle portion. The carrier head may also includea flange connected to a drive shaft and a gimbal pivotally connecting the flange to the base.
A carrier head for use in a chemical mechanical polishing system, comprising:
A carrier head for use in a chemical mechanical polishing system, comprising:
An assembly for use in a chemical mechanical polishing system, comprising:
A carrier head assembly for use in a chemical mechanical polishing system, comprising:
A carrier head assembly for use in a chemical mechanical polishing system, comprising:
A carrier head for use in a chemical mechanical polishing system, comprising:
The carrier head of claim 25 wherein the inner member, the middle member, and the outer member are portions of a flexible membrane.
Dependencies are inferred from the claim text.