Coating and developing method and apparatus therefor
AssigneeTokyo Electron Limited
InventorsShinichiro Araki, Shinko Matsumoto, Noriyuki Anai
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Abstract
A coating and developing apparatus for coating a substrate with a plurality of color resists and for developing it after exposure, comprises: a scrubbing unit for scrubbing the substrate; a coating unit having a plurality of resist discharge nozzles for respectively discharging a plurality of color resists on the scrubbed substrate; and a developing unit for developing the substrate coated with the color resists after exposure. Accordingly, reduction in size of apparatus and space savings can be achieved, and manufacturing cost can also be reduced.
Claims17
A coating and developing method, comprising the steps of:
- coating a substrate with a selected predetermined color resist out of a plurality of kinds of color resists;
- transferring the substrate coated with the predetermined color resist to an aligner;
- and
- developing the exposed substrate received from the aligner,
- in which after repeats of said steps in due order, the substrate is housed in a cassette which can house therein a plurality of substrates.
A coating and developing apparatus for coating a substrate with a plurality of color resists and for developing it after exposure, comprising:
- a resist coating unit having a plurality of resist discharge nozzles for respectively discharging the plurality of color resists to a substrate;
- and
- a developing unit for developing the substrate coated with the color resist after exposure.
A coating and developing apparatus, comprising:
- a resist coating unit for coating a substrate with a selected predetermined color resist out of a plurality of kinds of color resists;
- a developing unit for developing the exposed substrate which is coated with the predetermined color resist, transferred to an aligner, and received therefrom;
- and
- a transfer mechanism for transferring the substrate between the units and the aligner,
- said resist coating unit including at least one nozzle for discharging the plurality of kinds of color resists and a cleaning mechanism for cleaning the inside of the nozzle.
Dependencies are inferred from the claim text.