Standard for a nanotopography unit, and a method for producing the standard
AssigneeWacker Siltronic Gesellschaft fur Halbleitermaterialien AG
InventorsFriedrich Passek, Reinhard Schauer, Rudiger Schmolke, Ralf Kumpe
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Abstract
A standard for calibrating and checking a nanotopography unit, includes a substrate and at least one structure which is deposited on the substrate. It has a lateral extent of 0.5 to 20 mm and a vertical extent of 5 to 500 nm and is bounded by edges which have a gradient of at most 1*10−3. There is also a method for producing the standard, with material being deposited on the substrate at an inhomogeneous deposition rate.
Claims18
A standard for calibrating and checking a nanotopography unit, comprising
- a substrate;
- and
- at least one structure which is deposited on the substrate and has a lateral extent of 0.5 to 20 mm and a vertical extent of 5 to 500 nm and which is bounded by edges which have a gradient of at most 1*10−3.
A method for producing a standard for calibrating and checking a nanotopography unit, comprising
- depositing on a substrate a material which produces at least one structure which has a lateral extent of 0.5 to 20 mm and a vertical extent of 5 to 500 nm and is bounded by edges which have a gradient of at most 1*10−3;
- and
- depositing said material on said substrate at an inhomogeneous deposition rate.
Dependencies are inferred from the claim text.