Methods of cleaning vaporization surfaces

A method of forming a vapor and cleaning a vaporization surface, comprising:

• flowing at least one liquid across a heated vaporization surface to form a vapor;
• accumulating a deposition on the heated vaporization surface as the surface is utilized for forming a vapor;
• and
• utilizing the vaporization surface as an electrode to form a plasma within the device, the plasma cleaning at least some of the deposition from the vaporization surface.

A method of chemical vapor deposition, comprising:

• providing a vaporization surface;
• heating the vaporization surface;
• flowing at least one material past the heated surface to vaporize said material;
• forming a deposit on the vaporization surface during the vaporization;
• utilizing the vaporization surface as an electrode to form a plasma;
• and
• removing at least a portion of the deposit with the plasma.

A vapor forming device comprising:

• a vaporization surface configured to vaporize a non-vapor-state-material;
• a first plasma electrode spaced from the vaporization surface;
• and
• plasma generation circuitry configured to utilize the vaporization surface as a second plasma electrode and to form a plasma between the first and second plasma electrodes.

A vapor forming device comprising:

• a non-vapor-state-material input region;
• a vaporization surface;
• a flow path between the non-vapor-state-material input region and the vaporization surface;
• a vapor-state-material output region;
• a vapor flow path from the vaporization surface to the vapor-state-material output region;
• a first plasma electrode spaced from the vaporization surface;
• and
• plasma generation circuitry configured to utilize the vaporization surface as a second plasma electrode and to form a plasma between the first and second plasma electrodes.