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US 2001/0037487 A1Published application
Method of extracting characters and computer-readable recording medium
AssigneeKabushiki Kaisha Toshiba
InventorsRyoichi Inanami, Shunko Magoshi
Life of this patent
Estimating the term…
Abstract
Using the hierarchy cell5, cell51, cell52, cell4 of the figure cells in the design pattern data, it is not necessary to take the actual forms of patterns and the arrangement information of data (relation between patterns, period of arrangement) into consideration, and therefore, characters for CP exposure can be extracted effectively.
Claims15
A method of extracting characters comprising:
- a first step of preparing design data having a hierarchy with regard to figure cells, the design data being design data of a device pattern for exposure;
- and
- a second step of extracting candidates for the figure cells corresponding to said characters from all levels of figure cells in said design pattern data by using a hierarchy with regard to the figure cells in said design pattern data so that at least one of the number of kinds of characters and the number of shots of electron beams as a unit in performing an electron beam exposure of character projection system may be the smallest when said exposure is performed using at least a part of said device pattern.
A program product for operating a computer, said computer program product comprising:
- a first program instruction means for causing a computer to read in the design data including the hierarchy with regard to he figure cells, the design data being design data of a device pattern for exposure;
- and
- a second program instruction means for extracting candidates for the figure cells corresponding to said characters from all levels of figure cells in said design pattern data by using a hierarchy with regard to the figure cells in said design pattern data so that at least one of the number of kinds of characters or the number of shots of electron beams as a unit in performing an electron beam exposure of character projection system may be the smallest when said exposure is performed using at least a part of said device pattern.
Dependencies are inferred from the claim text.