Chemical amplification type resist composition
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTakanobu Takeda, Osamu Watanabe, Jun Watanabe, Jun Hatakeyama, Tsunehiro Nishi, Takeshi Kinsho
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AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTakanobu Takeda, Osamu Watanabe, Jun Watanabe, Jun Hatakeyama, Tsunehiro Nishi, Takeshi Kinsho
Estimating the term…
A chemical amplification type resist composition uses as the base resin a polymer having a molecular weight dispersity of 1.0 to 1.5 which is a polymer comprising recurring units of formula (1) and recurring units of formula (2) or a polymer comprising recurring units of formula (2) wherein R1 is alkyl, alkoxyalkyl, acetyl or carbonylalkoxy, 0<p/(p+q)≦1, R2 is hydrogen or methyl, and R3 is a tertiary hydrocarbon group of 4 to 30 carbon atoms. By virtue of the narrow dispersity effect of the polymer, the resist composition is improved in resolution as compared with prior art base resins having a wide dispersity. Advantages including a high resolution, good pattern profile and storage stability are obtained. 1
A chemical amplification type resist composition comprising a polymer having a molecular weight dispersity of 1.0 to 1.5 selected from the group consisting of a polymer comprising recurring units of formula (1) and recurring units of formula (2), a polymer comprising recurring units of formula (2), a polymer comprising recurring units of formula (2) and recurring units of formula (4), a polymer comprising recurring units of formula (3), and a polymer comprising recurring units of formula (4),
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