Thin-film magnetic head manufacturing method and apparatus
OwnerMasato Katoh, Shigenobu Miyajimainventors
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Abstract
In a thin-film magnetic head manufacturing method and apparatus, lapping is continued until the MR height of a magnetoresistive sensor falls into a finish tolerance range and the lapping time from the beginning of lapping exceeds a predetermined time, thereby substantially reducing the recession between an ABS of a slider bar and a surface of a thin-film magnetic element opposing a recording medium.
Claims30
A thin-film magnetic head manufacturing method for forming a thin-film magnetic element including a magnetoresistive sensor by stacking thin-film layers, such as an insulating layer, a magnetic layer, and a conductive layer, on a substrate, and for adjusting the MR height by lapping said substrate and said thin-film magnetic element in the height direction while measuring the resistance value of said magnetoresistive sensor, wherein lapping is continued until the lapping time exceeds a predetermined time and the resistance value or the MR height converted from the resistance value falls into the finish tolerances.
A thin-film magnetic head manufacturing method for forming a thin-film magnetic element including a magnetoresistive sensor by stacking thin-film layers, such as an insulating layer, a magnetic layer, and a conductive layer, on a substrate, and for adjusting the MR height by lapping said substrate and said thin-film magnetic element in the height direction while measuring the resistance value of said magnetoresistive sensor, wherein the rotation rate of a lapping plate in a lapping machine for use in lapping is switched to a lower rate at least once to complete lapping when the resistance value or the MR height converted from the resistance value falls below a reference value.
A thin-film magnetic head manufacturing method for forming a thin-film magnetic element including a magnetoresistive sensor by stacking thin-film layers, such as an insulating layer, a magnetic layer, and a conductive layer, on a substrate, and for adjusting the MR height by lapping said substrate and said thin-film magnetic element in the height direction while measuring the resistance value of said magnetoresistive sensor, wherein the rotation rate of a lapping plate in a lapping machine for use in lapping is switched to a lower rate at least once to complete lapping when the resistance value or the MR height converted from the resistance value falls below a reference value, and wherein lapping is continued until the lapping time exceeds a predetermined time and the resistance value or the MR height converted from the resistance value falls into the finish tolerances.
A thin-film magnetic head manufacturing apparatus comprising:
- holding means for holding a thin-film magnetic head in which a thin-film magnetic element including a magnetoresistive sensor is formed on a substrate;
- a lapping machine for lapping said substrate and said thin-film magnetic element in said thin-film magnetic head held by said holding means;
- resistance measuring means for measuring the resistance value of said magnetoresistive sensor during lapping;
- and
- control means for monitoring the resistance value measured by said resistance measuring means or the MR height converted from the resistance value, determining whether the lapping time exceeds a predetermined time, and controlling said lapping machine so that lapping is continued until the lapping time exceeds the predetermined time and the resistance value or the MR height falls into finish tolerances.
A thin-film magnetic head manufacturing apparatus comprising:
- holding means for holding a thin-film magnetic head in which a thin-film magnetic element including a magnetoresistive sensor is formed on a substrate;
- a lapping machine for lapping said substrate and said thin-film magnetic element in said thin-film magnetic head held by said holding means;
- resistance measuring means for measuring the resistance value of said magnetoresistive sensor during lapping;
- speed changing means for changing the rotation rate of a lapping plate in said lapping machine;
- and
- control means for monitoring the resistance value measured by said resistance measuring means or the MR height converted from the resistance value, and controlling said speed changing means so that the rotation rate of said lapping plate in said lapping machine is switched to a lower rate at least once when the resistance value or the MR height converted from the resistance value falls below a reference value.
A thin-film magnetic head manufacturing apparatus comprising:
- holding means for holding a thin-film magnetic head in which a thin-film magnetic element including a magnetoresistive sensor is formed on a substrate;
- a lapping machine for lapping said substrate and said thin-film magnetic element in said thin-film magnetic head held by said holding means;
- resistance measuring means for measuring the resistance value of said magnetoresistive sensor during lapping;
- speed changing means for changing the rotation rate of a lapping plate in said lapping machine;
- and
- control means for monitoring the resistance value measured by said resistance measuring means or the MR height converted from the resistance value, determining whether the lapping time exceeds a predetermined time, controlling said lapping machine so that lapping is continued until the lapping time exceeds the predetermined time and the resistance value or the MR height falls into finish tolerances, and controlling said speed changing means so that the rotation rate of said lapping plate in said lapping machine is switched to a lower rate at least once when the resistance value or the MR height converted from the resistance value falls below a reference value.
Dependencies are inferred from the claim text.