Chemical amplification, positive resist compositions
AssigneeShi-Etsu Chemical Co., Ltd.
InventorsYouichi Ohsawa, Jun Watanabe, Takanobu Takeda, Akihiro Seki
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Abstract
A chemical amplification, positive resist composition is provided comprising (A) a photoacid generator and (B) a resin which changes its solubility in an alkali developer under the action of acid and has substituents of the formula: C6H11—(CH2)nOCH(CH2CH3)— wherein C6H11 is cyclohexyl and n=0 or 1. The composition has many advantages including improved focal latitude, improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect left after coating, development and stripping, and improved pattern profile after development and is suited for microfabrication by any lithography, especially deep UV lithography.
Claims5
A chemical amplification, positive resist composition comprising
- (A) a photoacid generator and
- (B) a resin which changes its solubility in an alkali developer under the action of acid and has substituents of the following general formula (1):
- C6H11—(CH2)nOCH(CH2CH3)— (1)
- wherein C6H11 is cyclohexyl and n is 0 or 1.
Dependencies are inferred from the claim text.