Back to results
US 2001/0033989 A1Published application
Novel polymers, resist compositions and patterning process
OwnerYuji Harada, Jun Watanabe +1inventors
InventorsYuji Harada, Jun Watanabe, Jun Hatakeyama
Life of this patent
Estimating the term…
Abstract
Polymers having fluorinated ester groups are novel. Using the polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.
Claims7
A polymer having groups of the following general formula (1):
- 18
- wherein R1, R2, R3 and R4 are independently hydrogen, fluorine or unsubstituted or fluorinated, straight, branched or cyclic alkyl groups of 1 to 20 carbon atoms, and at least one of R1, R2, R3 and R4 contains fluorine.
Dependencies are inferred from the claim text.