Optical apparatus, exposure apparatus, and exposure method
AssigneeNikon Corporation
InventorsMotoo Koyama, Masaki Kato, Hidefumi Shibano
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Abstract
The present invention provides optical apparatus 17 wherein a thin film 22 with an optical characteristic having wavelength dependence is formed on an optical surface, which comprises a suppressor 20 for suppressing the wavelength dependence in a predetermined wavelength band.
Claims20
Optical apparatus in which a thin film with an optical characteristic having wavelength dependence is formed on an optical surface,
- said optical apparatus comprising a suppressor to suppress said wavelength dependence in a predetermined wavelength band.
An exposure apparatus for transferring a predetermined pattern formed on a mask under illumination, onto a workpiece, comprising:
- a light source;
- an illumination optical system arranged in an optical path between said light source and said mask;
- a projection optical system arranged in an optical path between said mask and said workpiece;
- a thin film, with an optical charatcteristic having wavelength dependence, formed on an optical surface arranged in at least one of said optical paths;
- and,
- a suppressor, arranged in at least one of said optical paths, to suppress said wavelength dependence in a predetermined wavelength range.
The exposure apparatus according to clam 13, wherein said predetermined wavelength range includes a wavelength of an illumination light.
An exposure method of transferring a predetermined pattern formed on a mask under illumination, onto a workpiece, comprising the steps of:
- providing a light from a light source;
- illuminating said mask with said light from the light source;
- projecting said pattern on said mask onto said workpiece;
- passing the light through a thin film with an optical characteristic having wavelength dependence;
- and,
- passing the light through a suppressor,
- wherein said thin film is formed on an optical surface in an optical path between said light source and said workpiece, and
- wherein said suppressor suppresses said wavelength dependence in a predetermined wavelength range.
Dependencies are inferred from the claim text.